- Author
- Jan Musschoot, Qi Xie (UGent) , Davy Deduytsche (UGent) , Koen De Keyser, Delphine Longrie (UGent) , Johan Haemers (UGent) , Sven Van den Berghe, Roland Van Meirhaeghe, Jan D'Haen and Christophe Detavernier (UGent)
- Organization
- Keywords
- Atomic layer deposition, Ruthenium, Texture, Silicide, Ammonia plasma, RU THIN-FILMS, GROWTH
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-1007853
- MLA
- Musschoot, Jan, et al. “Texture of Atomic Layer Deposited Ruthenium.” MICROELECTRONIC ENGINEERING, vol. 87, no. 10, 2010, pp. 1879–83, doi:10.1016/j.mee.2009.11.020.
- APA
- Musschoot, J., Xie, Q., Deduytsche, D., De Keyser, K., Longrie, D., Haemers, J., … Detavernier, C. (2010). Texture of atomic layer deposited ruthenium. MICROELECTRONIC ENGINEERING, 87(10), 1879–1883. https://doi.org/10.1016/j.mee.2009.11.020
- Chicago author-date
- Musschoot, Jan, Qi Xie, Davy Deduytsche, Koen De Keyser, Delphine Longrie, Johan Haemers, Sven Van den Berghe, Roland Van Meirhaeghe, Jan D’Haen, and Christophe Detavernier. 2010. “Texture of Atomic Layer Deposited Ruthenium.” MICROELECTRONIC ENGINEERING 87 (10): 1879–83. https://doi.org/10.1016/j.mee.2009.11.020.
- Chicago author-date (all authors)
- Musschoot, Jan, Qi Xie, Davy Deduytsche, Koen De Keyser, Delphine Longrie, Johan Haemers, Sven Van den Berghe, Roland Van Meirhaeghe, Jan D’Haen, and Christophe Detavernier. 2010. “Texture of Atomic Layer Deposited Ruthenium.” MICROELECTRONIC ENGINEERING 87 (10): 1879–1883. doi:10.1016/j.mee.2009.11.020.
- Vancouver
- 1.Musschoot J, Xie Q, Deduytsche D, De Keyser K, Longrie D, Haemers J, et al. Texture of atomic layer deposited ruthenium. MICROELECTRONIC ENGINEERING. 2010;87(10):1879–83.
- IEEE
- [1]J. Musschoot et al., “Texture of atomic layer deposited ruthenium,” MICROELECTRONIC ENGINEERING, vol. 87, no. 10, pp. 1879–1883, 2010.
@article{1007853,
author = {{Musschoot, Jan and Xie, Qi and Deduytsche, Davy and De Keyser, Koen and Longrie, Delphine and Haemers, Johan and Van den Berghe, Sven and Van Meirhaeghe, Roland and D'Haen, Jan and Detavernier, Christophe}},
issn = {{0167-9317}},
journal = {{MICROELECTRONIC ENGINEERING}},
keywords = {{Atomic layer deposition,Ruthenium,Texture,Silicide,Ammonia plasma,RU THIN-FILMS,GROWTH}},
language = {{eng}},
number = {{10}},
pages = {{1879--1883}},
title = {{Texture of atomic layer deposited ruthenium}},
url = {{http://doi.org/10.1016/j.mee.2009.11.020}},
volume = {{87}},
year = {{2010}},
}
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