Ghent University Academic Bibliography

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High-k dielectrics for future generation memory devices (Invited Paper)

JA Kittl, K Opsomer, M Popovici, N Menou, B Kaczer, XP Wang, C Adelmann, MA Pawlak, K Tomida, A Rothschild, et al.

(2009) MICROELECTRONIC ENGINEERING. 86(7-9). p.1789-1795
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Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry

shankar kumar Selvaraja (UGent) , Erik Sleeckx, Marc Schaekers, Wim Bogaerts (UGent) , Dries Van Thourhout (UGent) , Pieter Dumon (UGent) and Roel Baets (UGent)

(2009) OPTICS COMMUNICATIONS. 282(9). p.1767-1770
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Highly efficient grating coupler between optical fiber and silicon photonic circuit

shankar kumar Selvaraja (UGent) , Diedrik Vermeulen (UGent) , Marc Schaekers, Erik Sleeckx, Wim Bogaerts (UGent) , Günther Roelkens (UGent) , Pieter Dumon (UGent) , Dries Van Thourhout (UGent) and Roel Baets (UGent)

(2009) 2009 CONFERENCE ON LASERS AND ELECTRO-OPTICS AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (CLEO/QELS 2009), VOLS 1-5. p.1293-1294
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- Conference Paper
- C1
- open access
Demonstration of optical via and low-loss optical crossing for vertical integration Of silicon photonic circuits

shankar kumar Selvaraja (UGent) , Pieter Dumon (UGent) , Erik Sleeckx, Marc Schaekers, Wim Bogaerts (UGent) , Dries Van Thourhout (UGent) and Roel Baets (UGent)

(2008) International Conference on Fiber Optics and Photonics, 9th, Proceedings.
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- Conference Paper
- C1
- open access
Low loss amorphous silicon photonic wire and ring resonator fabricated by CMOS process

shankar kumar Selvaraja (UGent) , Erik Sleeckx, Wim Bogaerts (UGent) , Marc Schaekers, Pieter Dumon (UGent) , Dries Van Thourhout (UGent) and Roel Baets (UGent)

(2007) 33rd European conference and exhibition on Optical Communication : post deadline papers.
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- Conference Paper
- C1
- open access
Deposited silicon-on-insulator material technology for photonic integrated circuitry

shankar kumar Selvaraja (UGent) , Dries Van Thourhout (UGent) , Roel Baets (UGent) , E SLEECKX and M SCHAEKERS

(2007) 12th IEEE/LEOS Benelux Annual Symposium 2007. p.15-18
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- Conference Paper
- C1
- open access
Polycrystalline silicon as waveguide material for advanced photonic

shankar kumar Selvaraja (UGent) , M SCHAEKERS, Wim Bogaerts (UGent) , Dries Van Thourhout (UGent) and Roel Baets (UGent)

(2007) Annual Workshop of the IEEE/LEOS Benelux Chapter - PROCEEDINGS 2007. p.19-20
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- Journal Article
- A1
Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

F IACOPI, PM VEREECKEN, M SCHAEKERS, M CAYMAX, N MOELANS, B BLANPAIN, O RICHARD, Christophe Detavernier (UGent) and H GRIFFITHS

(2007) NANOTECHNOLOGY. 18(50).
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- Journal Article
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Quantitative analysis of trace metals in silicon nitride films by a vapor phase decomposition/solution collection approach

G VEREECKE, M SCHAEKERS, Koenraad Verstraete (UGent) , S ARNAUTS, MM HEYNS and W PLANTE

(2000) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 147(4). p.1499-1501
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- Journal Article
- A1
CD control using SiON BARL processing for sub-0.25 mu m lithography

F Zhang, Maaike Op de Beeck (UGent) , M Schaekers, K Ronse, W Conley, P Gopalan, H Gangala, M Dusa and J Bendik

(1999) MICROELECTRONIC ENGINEERING. 46(1-4). p.51-54

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Academic Bibliography

High-k dielectrics for future generation memory devices (Invited Paper)

Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry

Highly efficient grating coupler between optical fiber and silicon photonic circuit

Demonstration of optical via and low-loss optical crossing for vertical integration Of silicon photonic circuits

Low loss amorphous silicon photonic wire and ring resonator fabricated by CMOS process

Deposited silicon-on-insulator material technology for photonic integrated circuitry

Polycrystalline silicon as waveguide material for advanced photonic

Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

Quantitative analysis of trace metals in silicon nitride films by a vapor phase decomposition/solution collection approach

CD control using SiON BARL processing for sub-0.25 mu m lithography

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