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Mechanism of in-plane alignment in magnetron sputtered biaxially aligned yttria-stabilized zirconia
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- Journal Article
- A1
- open access
An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment
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Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation
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Hydrogen-plasma-induced plate-like cavity clusters in single-crystalline germanium
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Chemical and morphological changes of historical lead objects as a result of the use of electrolytic reduction as a stabilization treatment
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A comparative XPS and UPS study of VOx layers on mineral TiO2(001)-anatase supports
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Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering
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The d.c. magnetron sputtering behavior of TiO2-x targets with added Fe2O3 or Nd2O3
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Monte Carlo simulation of the transport of atoms in DC magnetron sputtering
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Scanning electron microscopy study of the growth mechanism of biaxially aligned magnesium oxide layers grown by unbalanced magnetron sputtering
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Growth mechanism of biaxially aligned magnesium oxide deposited by unbalanced magnetron sputtering
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Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering
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A fully oxidized V2O5/TiO2(001)-anatase system studied with in situ synchrotron photoelectron spectroscopy
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Influence of the Ar/O-2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering
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Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers