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Discharge voltage measurements during reactive sputtering of oxides
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Influence of the target composition on the discharge voltage during magnetron sputtering
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Structure evolution of the biaxial alignment in sputter-deposited MgO and Cr
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Hysteresis behavior during reactive magnetron sputtering of A(2)O(3) using a rotating cylindrical magnetron
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Mechanism of biaxial alignment in thin films, deposited by magnetron sputtering
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Biaxial alignment in sputter deposited thin films
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Mechanism of in-plane alignment in magnetron sputtered biaxially aligned yttria-stabilized zirconia
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- Journal Article
- A1
- open access
An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment
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Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation
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Hydrogen-plasma-induced plate-like cavity clusters in single-crystalline germanium