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Calculation of oxide sputter yields
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- Journal Article
- A1
- open access
Plasmonic effects in the neutralization of slow ions at a metallic surface
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- Journal Article
- A1
- open access
On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering
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- Journal Article
- A1
- open access
Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering
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- Journal Article
- A1
- open access
The measurement and impact of negative oxygen ions during reactive sputter deposition
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- Journal Article
- A1
- open access
Analysis of stress in sputter-deposited films using a kinetic model for Cu, Ni, Co, Cr, Mo, W
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- Journal Article
- A1
- open access
Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions
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- Journal Article
- A1
- open access
Effect of growth temperature and atmosphere exposure time on impurity incorporation in sputtered Mg, Al, and Ca thin films
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- Journal Article
- A1
- open access
Cell behavior changes and enzymatic biodegradation of hybrid electrospun poly(3-hydroxybutyrate)-based scaffolds with an enhanced piezoresponse after the addition of reduced graphene oxide
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- Journal Article
- A1
- open access
Chemical stability of sputter deposited silver thin films
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- Journal Article
- A1
- open access
A computational study of the double hysteresis phenomenon during reactive sputtering
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- Journal Article
- A1
- open access
Effect of processing conditions on residual stress in sputtered transition metal nitrides (TiN, ZrN and TaN) : experiments and modeling
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On the grain size-thickness correlation for thin films
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Sputter deposition with powder targets : an overview
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- Journal Article
- A1
- open access
Influence of impurities on the front velocity of sputter deposited Al/CuO thermite multilayers
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- Journal Article
- A1
- open access
Sputter deposited metal layers embedded in composites : from fundamentals to applications
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- Journal Article
- A1
- open access
The growth of a multi-principal element (CoCrFeMnNi) oxynitride film by direct current magnetron sputtering using air as reactive gas
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Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures
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Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films
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- Journal Article
- A1
- open access
Understanding residual stress in thin films : analyzing wafer curvature measurements for Ag, Cu, Ni, Fe, Ti, and Cr with a kinetic model