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UV cure of oxycarbosilane low-k films
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- Journal Article
- A1
- open access
Effect of the C-bridge length on the ultraviolet-resistance of oxycarbosilane low-k films
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- Journal Article
- A1
- open access
Modification of ultra low-k dielectric films by O₂ and CO₂ plasmas
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- Journal Article
- A1
- open access
Pore narrowing of mesoporous silica materials
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Sealed ultra low-k organosilica films with improved electrical, mechanical and chemical properties
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Atomic layer deposition of TiO₂ on surface modified nanoporous low-k films
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A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers
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Ultra low-k cyclic carbon-bridged PMO films with a high chemical resistance
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In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry
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Tuning the pore size of ink-bottle mesopores by atomic layer deposition