Ghent University Academic Bibliography

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Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Femi Mathew (UGent) , Nithin Poonkottil (UGent) , Eduardo Solano Minuesa (UGent) , Dirk Poelman (UGent) , Zeger Hens (UGent) , Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2023) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 41(6).
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Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth

Andreas Werbrouck (UGent) , Kevin Van de Kerckhove, Diederik Depla (UGent) , Dirk Poelman (UGent) , Philippe Smet (UGent) , Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2021) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 39(6).
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A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

Li'ao Cao (UGent) , Felix Mattelaer (UGent) , Timo Sajavaara, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2020) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 38(2).
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Atomic layer deposition of thin films as model electrodes : a case study of the synergistic effect in Fe2O3-SnO2

Jeroen Kint, Felix Mattelaer (UGent) , Matthias Minjauw (UGent) , Bo Zhao (UGent) and Christophe Detavernier (UGent)

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 37(5).
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Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

Fatemeh SM Hashemi, Li'ao Cao (UGent) , Felix Mattelaer (UGent) , Timo Sajavaara, J Ruud van Ommen and Christophe Detavernier (UGent)

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 37(4).
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Corrosion protection of Cu by atomic layer deposition

Véronique Cremers (UGent) , Geert Rampelberg (UGent) , Kitty Baert, Shoshan Abrahami, Nathalie Claes, Thais Milagres de Oliveira, Herman Terryn, Sara Bals, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 37(6).
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Plasma enhanced atomic layer deposition of gallium sulfide thin films

Jakob Kuhs (UGent) , Zeger Hens (UGent) and Christophe Detavernier (UGent)

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 37(2).
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Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO

Violeta Prodanovic, Hong Wah Chan, Anil U Mane, Jeffrey W Elam, Matthias Minjauw (UGent) , Christophe Detavernier (UGent) , Harry van der Graaf and Pasqualina M. Sarro

(2018) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 36(6).
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Annealing of thin 'Tincone' films, a tin-based hybrid material deposited by molecular layer deposition, in reducing, inert, and oxidizing atmospheres

Kevin Van de Kerckhove, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2018) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 36(5).
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Plasma enhanced atomic layer deposition of aluminum sulfide thin films

Jakob Kuhs (UGent) , Zeger Hens (UGent) and Christophe Detavernier (UGent)

(2018) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 36(1).

Academic Bibliography

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth

A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

Atomic layer deposition of thin films as model electrodes : a case study of the synergistic effect in Fe2O3-SnO2

Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

Corrosion protection of Cu by atomic layer deposition

Plasma enhanced atomic layer deposition of gallium sulfide thin films

Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO

Annealing of thin 'Tincone' films, a tin-based hybrid material deposited by molecular layer deposition, in reducing, inert, and oxidizing atmospheres

Plasma enhanced atomic layer deposition of aluminum sulfide thin films

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