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A computational study of the double hysteresis phenomenon during reactive sputtering
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Plasma degradation of trichloroethylene : process optimization and reaction mechanism analysis
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Technology computer aided design based deep level transient spectra : simulation of high-purity germanium crystals
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Ion beam modification of the Ni-Si solid-phase reaction : the influence of substrate damage and nitrogen impurities introduced by ion implantation
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Spatially and temporally non-uniform plasmas : microdischarges from the perspective of molecules in a packed bed plasma reactor
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- Journal Article
- A1
- open access
Impurity-enhanced solid-state amorphization : the Ni-Si thin film reaction altered by nitrogen
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Fast micromagnetic simulations on GPU : recent advances made with mumax³
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Anomalous effects in the aluminum oxide sputtering yield
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- Journal Article
- A1
- open access
Axiotaxy and epitaxial textures in C54-TiSi2 films on Si(001) and Si(111) substrates
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Coupling of the skyrmion velocity to its breathing mode in periodically notched nanotracks