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Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium
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Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor
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Near room temperature plasma enhanced atomic layer deposition of gold metal
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- Conference Paper
- C3
- open access
Cost-reducing PE-ALD processes for pure and doped SiO2 thin films
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- Conference Paper
- C3
- open access
Stabilizing red fluoride phosphors for white LEDs using atomic layer deposition
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- Conference Paper
- C3
- open access
Time-resolved in-situ mass spectrometry for monitoring and identifying reaction products in ALD processes