Ghent University Academic Bibliography

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Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films

Yiting Sun, Elisabeth Levrau, Liping Zhang, Jef Geypen, Johan Meersschaut, Alexis Franquet, Quoc Le Le, Jean-François de Marneffe, Hugo Bender, Herbert Struyf, et al.

(2015) MICROELECTRONIC ENGINEERING. 137. p.70-74
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- Journal Article
- A1
- open access
Pore narrowing of mesoporous silica materials

Frederik Goethals (UGent) , Elisabeth Levrau, Els De Canck (UGent) , Mikhail R Baklanov, Christophe Detavernier (UGent) , Isabel Van Driessche (UGent) and Pascal Van Der Voort (UGent)

(2013) MATERIALS. 6(2). p.570-579
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Atomic layer deposition of TiO₂ on surface modified nanoporous low-k films

Elisabeth Levrau, Kilian Devloo-Casier (UGent) , Jolien Dendooven (UGent) , Karl F Ludwig, Patrick Verdonck, Johan Meersschaut, Mikhail R Baklanov and Christophe Detavernier (UGent)

(2013) LANGMUIR. 29(39). p.12284-12289
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Sealed ultra low-k organosilica films with improved electrical, mechanical and chemical properties

Frederik Goethals (UGent) , Elisabeth Levrau, Glenn Pollefeyt (UGent) , Mikhail R Baklanov, Ivan Ciofi, Kris Vanstreels, Christophe Detavernier (UGent) , Isabel Van Driessche (UGent) and Pascal Van Der Voort (UGent)

(2013) JOURNAL OF MATERIALS CHEMISTRY C. 1(25). p.3961-3966
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A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers

Frederik Goethals (UGent) , Mikhail R Baklanov, Ivan Ciofi, Christophe Detavernier (UGent) , Pascal Van Der Voort (UGent) and Isabel Van Driessche (UGent)

(2012) CHEMICAL COMMUNICATIONS. 48(22). p.2797-2799

Academic Bibliography

Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films

Pore narrowing of mesoporous silica materials

Atomic layer deposition of TiO₂ on surface modified nanoporous low-k films

Sealed ultra low-k organosilica films with improved electrical, mechanical and chemical properties

A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers

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