Ghent University Academic Bibliography

Journal Article
A1
open access

Polymer assisted area selective ALD of multilayered materials using alkylamine precursors

Nithin Poonkottil, Aditya Chalishazar (UGent) , Hannes Rijckaert (UGent) , Chao Pang (UGent) , Dries Van Thourhout (UGent) , Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2026) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 44(2).

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Journal Article
A1
open access

Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor

Ruben Blomme (UGent) , Aditya Chalishazar (UGent) , Lowie Henderick (UGent) , Frans Munnik, Johan Meersschaut, Matthias Minjauw (UGent) , Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2025) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 43(2).

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Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography

Ajay Ravi, Long Viet Than, Jacqueline Lewis, Jingwei Shi, Andreas Werbrouck (UGent) , Jingyi Han, Miika Mattinen and Stacey F. Bent

(2024) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 42(6).

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Journal Article
A1
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Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Femi Mathew (UGent) , Nithin Poonkottil, Eduardo Solano Minuesa (UGent) , Dirk Poelman (UGent) , Zeger Hens (UGent) , Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2023) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 41(6).

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A1
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Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth

Andreas Werbrouck (UGent) , Kevin Van de Kerckhove, Diederik Depla (UGent) , Dirk Poelman (UGent) , Philippe Smet (UGent) , Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2021) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 39(6).

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Journal Article
A1
open access

A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

Li'ao Cao (UGent) , Felix Mattelaer (UGent) , Timo Sajavaara, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2020) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 38(2).

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Journal Article
A1
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Corrosion protection of Cu by atomic layer deposition

Véronique Cremers (UGent) , Geert Rampelberg (UGent) , Kitty Baert, Shoshan Abrahami, Nathalie Claes, Thais Milagres de Oliveira, Herman Terryn, Sara Bals, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 37(6).

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Atomic layer deposition of thin films as model electrodes : a case study of the synergistic effect in Fe2O3-SnO2

Jeroen Kint, Felix Mattelaer (UGent) , Matthias Minjauw (UGent) , Bo Zhao (UGent) and Christophe Detavernier (UGent)

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 37(5).

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Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

Fatemeh SM Hashemi, Li'ao Cao (UGent) , Felix Mattelaer (UGent) , Timo Sajavaara, J Ruud van Ommen and Christophe Detavernier (UGent)

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 37(4).

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Journal Article
A1
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Plasma enhanced atomic layer deposition of gallium sulfide thin films

Jakob Kuhs (UGent) , Zeger Hens (UGent) and Christophe Detavernier (UGent)

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 37(2).

Academic Bibliography

Polymer assisted area selective ALD of multilayered materials using alkylamine precursors

Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor

Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth

A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

Corrosion protection of Cu by atomic layer deposition

Atomic layer deposition of thin films as model electrodes : a case study of the synergistic effect in Fe2O3-SnO2

Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

Plasma enhanced atomic layer deposition of gallium sulfide thin films

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