Ghent University Academic Bibliography

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Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins : the effect of the support on the liquid phase epoxidation of cyclohexene

Ilke Muylaert (UGent) , Jan Musschoot, Karen Leus (UGent) , Jolien Dendooven (UGent) , Christophe Detavernier (UGent) and Pascal Van Der Voort (UGent)

(2012) EUROPEAN JOURNAL OF INORGANIC CHEMISTRY. p.251-260
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Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

Jan Musschoot, Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Johan Haemers (UGent) , G Buyle and Christophe Detavernier (UGent)

(2012) SURFACE & COATINGS TECHNOLOGY. 206(22). p.4511-4517
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Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot, Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2010) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 157(4). p.G111-G116
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- Conference Paper
- C3
- open access
Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot and Christophe Detavernier (UGent)

(2010) Atomic Layer Deposition, 10th International conference, Abstracts.
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Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot, Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2009) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 156(4). p.P63-P67
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- Conference Paper
- C3
- open access
Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien Dendooven (UGent) , Jan Musschoot, Davy Deduytsche (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2009) Atomic Layer Deposition, 9th Baltic conference.
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- Conference Paper
- P1
Thermal versus plasma-enhanced ALD : growth kinetics and conformality

Christophe Detavernier (UGent) , Jolien Dendooven (UGent) , Davy Deduytsche (UGent) and Jan Musschoot

(2008) ECS Transactions. In ECS Transactions 16(4). p.239-246
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- Conference Paper
- C3
- open access
Conformality of thermal and plasma enhanced ALD

Jolien Dendooven (UGent) , Jan Musschoot, Davy Deduytsche (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2008) Atomic Layer Deposition, 8th International conference, Abstracts.

Academic Bibliography

Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins : the effect of the support on the liquid phase epoxidation of cyclohexene

Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Thermal versus plasma-enhanced ALD : growth kinetics and conformality

Conformality of thermal and plasma enhanced ALD

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