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In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films
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Texture of atomic layer deposited ruthenium
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The effect of sputtered W-based carbide diffusion barriers on the thermal stability and void formation in copper thin films
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Nucleation and diffusion during growth of ternary Co1-xNixSi2 thin films studied by complementary techniques in real time
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Effect of Pt addition on growth stress and thermal stress of NiSi films