Academic Bibliography

Mark

Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

Jan Musschoot (UGent) , Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Johan Haemers (UGent) , G Buyle and Christophe Detavernier (UGent)

(2012) SURFACE & COATINGS TECHNOLOGY. 206(22). p.4511-4517

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journalArticle
A1
open access

The coordinatively saturated vanadium MIL-47 as a low leaching heterogeneous catalyst in the oxidation of cyclohexene

Karen Leus (UGent) , Matthias Vandichel (UGent) , Ying-Ya Liu (UGent) , Ilke Muylaert (UGent) , Jan Musschoot (UGent) , Steven Pyl (UGent) , Henk Vrielinck (UGent) , Freddy Callens (UGent) , Guy Marin (UGent) , Christophe Detavernier (UGent) , et al.

(2012) JOURNAL OF CATALYSIS. 285(1). p.196-207

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Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins: the effect of the support on the liquid phase epoxidation of cyclohexene

Ilke Muylaert (UGent) , Jan Musschoot (UGent) , Karen Leus (UGent) , Jolien Dendooven (UGent) , Christophe Detavernier (UGent) and Pascal Van Der Voort (UGent)

(2012) EUROPEAN JOURNAL OF INORGANIC CHEMISTRY. p.251-260

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journalArticle
A1
open access

TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer

Qi Xie (UGent) , Jan Musschoot (UGent) , Marc Schaekers, Matty Caymax, Annelies Delabie, Dennis Lin, Xin-Ping Qu, Yu-Long Jiang, Sven Van den Berghe and Christophe Detavernier (UGent)

(2011) ELECTROCHEMICAL AND SOLID STATE LETTERS. 14(5). p.G27-G30

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TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition

Qi Xie (UGent) , Davy Deduytsche (UGent) , Jan Musschoot (UGent) , Roland Vanmeirhaeghe (UGent) , Christophe Detavernier (UGent) , Shao-Feng Ding and Xin-Ping Qu

(2011) MICROELECTRONIC ENGINEERING. 88(5). p.646-650

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conference
C3
open access

Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot (UGent) and Christophe Detavernier (UGent)

(2010) Atomic Layer Deposition, 10th International conference, Abstracts.

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Texture of atomic layer deposited ruthenium

Jan Musschoot (UGent) , Qi Xie (UGent) , Davy Deduytsche (UGent) , Koen De Keyser (UGent) , Delphine Longrie (UGent) , Johan Haemers (UGent) , Sven Van den Berghe, Roland Van Meirhaeghe, Jan D'Haen and Christophe Detavernier (UGent)

(2010) MICROELECTRONIC ENGINEERING. 87(10). p.1879-1883

Mark

Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2010) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 157(4). p.G111-G116

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Ultrathin GeOxNy interlayer formed by in situ NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices

Qi Xie (UGent) , Jan Musschoot (UGent) , Marc Schaekers, Matty Caymax, Annelies Delabie, Xin-Ping Qu, Yy-Long Jiang, Sven Van den Berghe, JunHu Liu and Christophe Detavernier (UGent)

(2010) APPLIED PHYSICS LETTERS. 97(22).

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conference
C3
open access

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien Dendooven (UGent) , Jan Musschoot (UGent) , Davy Deduytsche (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2009) Atomic Layer Deposition, 9th Baltic conference.

Academic Bibliography

Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

The coordinatively saturated vanadium MIL-47 as a low leaching heterogeneous catalyst in the oxidation of cyclohexene

Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins: the effect of the support on the liquid phase epoxidation of cyclohexene

TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer

TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition

Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Texture of atomic layer deposited ruthenium

Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Ultrathin GeOxNy interlayer formed by in situ NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices

Modeling the conformality of atomic layer deposition: the effect of sticking probability

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