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- 2012
- Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate
- The coordinatively saturated vanadium MIL-47 as a low leaching heterogeneous catalyst in the oxidation of cyclohexene
- Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins: the effect of the support on the liquid phase epoxidation of cyclohexene
- 2011
- TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer
- TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition
- 2010
- Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition
- Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition
- Texture of atomic layer deposited ruthenium
- Ultrathin GeOxNy interlayer formed by in situ NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices
- 2009
- Modeling the conformality of atomic layer deposition: the effect of sticking probability