Ghent University Academic Bibliography

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TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition

Qi Xie (UGent) , Davy Deduytsche (UGent) , Jan Musschoot (UGent) , Roland Vanmeirhaeghe (UGent) , Christophe Detavernier (UGent) , Shao-Feng Ding and Xin-Ping Qu

(2011) MICROELECTRONIC ENGINEERING. 88(5). p.646-650
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Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2010) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 157(4). p.G111-G116
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- Conference Paper
- C3
- open access
Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien Dendooven (UGent) , Jan Musschoot (UGent) , Davy Deduytsche (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2009) Atomic Layer Deposition, 9th Baltic conference.
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Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2009) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 156(4). p.P63-P67
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Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

Jan Musschoot (UGent) , Davy Deduytsche (UGent) , Hilde Poelman (UGent) , Johan Haemers (UGent) , Roland Vanmeirhaeghe (UGent) , Sven Van den Berghe and Christophe Detavernier (UGent)

(2009) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 156(7). p.P122-P126
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Ru thin film grown on TaN by plasma enhanced atomic layer deposition

Qi Xie (UGent) , YL Jiang, Jan Musschoot (UGent) , Davy Deduytsche (UGent) , Christophe Detavernier (UGent) , Roland Vanmeirhaeghe (UGent) , S Van den Berghe, GP Ru, BZ Li and XP Qu

(2009) THIN SOLID FILMS. 517(16). p.4689-4693
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- Conference Paper
- C3
- open access
Conformality of thermal and plasma enhanced ALD

Jolien Dendooven (UGent) , Jan Musschoot (UGent) , Davy Deduytsche (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2008) Atomic Layer Deposition, 8th International conference, Abstracts.
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- Journal Article
- A1
Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition

Q XIE, Jan Musschoot (UGent) , Davy Deduytsche (UGent) , Roland Vanmeirhaeghe (UGent) , Christophe Detavernier (UGent) , S VAN DEN BERGHE, YL JIANG, GP RU, BZ LI and XP QU

(2008) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 155(9).

Academic Bibliography

TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition

Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

Ru thin film grown on TaN by plasma enhanced atomic layer deposition

Conformality of thermal and plasma enhanced ALD

Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition

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