Ghent University Academic Bibliography

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Defect engineering for shallow n-type junctions in germanium : facts and fiction

Eddy Simoen (UGent) , Marc Schaekers, Jinbiao Liu, Jun Luo, Chao Zhao, Kathy Barla and Nadine Collaert

(2016) PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. 213(22). p.2799-2808
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Low-frequency noise spectroscopy of bulk and border traps in nanoscale devices

Eddy Simoen (UGent) , Bogdan Cretu, Wen Fang, Marc Aoulaiche, Jean-Marc Routoure, Regis Carin, Jun Luo, Chao Zhao and Cor Claeys

(2016) Solid State Phenomena. 242. p.449-458
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Distinction between silicon and oxide traps using single-trap spectroscopy

Wen Fang, Eddy Simoen (UGent) , Marc Aoulaiche, Jun Luo, Chao Zhao and Cor Claeys

(2015) PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. 212(3). p.512-517
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Towards single-trap spectroscopy: generation-recombination noise in UTBOX SOI nMOSFETs

Eddy Simoen (UGent) , Bogdan Cretu, Wen Fang, Marc Aoulaiche, Jean-Marc Routoure, Regis Carin, Sara dos Santos, Jun Luo, Chao Zhao, Joao Antonio Martino, et al.

(2015) Physica Status Solidi C-Current Topics in Solid State Physics. 12(3). p.292-298
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Integration of 50nm half pitch single damascene copper trenches in Black Diamond (R) II by means of double patterning 193nm immersion lithography on metal hardmask

J. Van Olmen, A. Al-Bayati, G. Beyer, P. Boelen, L. Carbonell, Kelvin Chan, I. Ciofi, M. Claes, A. Cockburn, G. Druais, et al.

(2008) ADVANCED METALLIZATION CONFERENCE 2007 (AMC 2007). In MATERIALS RESEARCH SOCIETY CONFERENCE PROCEEDINGS 23. p.355-361

Academic Bibliography

Defect engineering for shallow n-type junctions in germanium : facts and fiction

Low-frequency noise spectroscopy of bulk and border traps in nanoscale devices

Distinction between silicon and oxide traps using single-trap spectroscopy

Towards single-trap spectroscopy: generation-recombination noise in UTBOX SOI nMOSFETs

Integration of 50nm half pitch single damascene copper trenches in Black Diamond (R) II by means of double patterning 193nm immersion lithography on metal hardmask

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