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Manufacturable DUV lithography processes for 0.25 mu m technology contact and via layers
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Characterisation and optimisation of CD control for 0.25 mu m CMOS applications
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DUV resist profile improvement on TiN deposited metal layer
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Optical proximity effects and correction strategies for chemical amplified DUV resists
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DUV LITHOGRAPHY FOR 0.35-MU-M CMOS PROCESSING
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FUNDAMENTAL PRINCIPLES OF PHASE-SHIFTING MASKS BY FOURIER OPTICS - THEORY AND EXPERIMENTAL-VERIFICATION
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LITHOGRAPHIC STRATEGIES FOR 0.35-MU-M POLY-GATES FOR RANDOM LOGIC APPLICATIONS
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SILYLATION OF NOVOLAC BASED RESISTS - INFLUENCE OF DEEP-ULTRAVIOLET INDUCED CROSS-LINKING
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DRY DEVELOPMENT OF SURFACE IMAGING RESISTS - A MAJOR PARAMETER FOR PROCESS OPTIMIZATION
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GAS-PHASE SILYLATION IN THE DIFFUSION ENHANCED SILYLATED RESIST PROCESS FOR APPLICATION TO SUB-0.5-MU-M OPTICAL LITHOGRAPHY