Ghent University Academic Bibliography

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Plasma-enhanced atomic layer deposition of zinc phosphate

Thomas Dobbelaere (UGent) , Matthias Minjauw (UGent) , Tareq Ahmad, PM Vereecken and Christophe Detavernier (UGent)

(2016) JOURNAL OF NON-CRYSTALLINE SOLIDS. 444. p.43-48
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- Journal Article
- A1
- open access
Towards metal-organic framework based field effect chemical sensors: UiO-66-NH2 for nerve agent detection

I Stassen, B Bueken, H Reinsch, JFM Oudenhoven, D Wouters, Julianna Hajek (UGent) , Veronique Van Speybroeck (UGent) , N Stock, PM Vereecken, R Van Schaijk, et al.

(2016) CHEMICAL SCIENCE. 7(9). p.5827-5832
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The effect of polyether suppressors on the nucleation and growth of copper on RuTa seeded substrate for direct copper plating

Magi Margalit Nagar (UGent) , A Radisic, Katrien Strubbe (UGent) and PM Vereecken

(2014) ELECTROCHIMICA ACTA. 127. p.315-326
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Nanostructured TiO2/carbon nanosheet hybrid electrode for high-rate thin-film lithium-ion batteries

S Moitzheim, CS Nimisha, Shaoren Deng (UGent) , Daire J Cott, Christophe Detavernier (UGent) and PM Vereecken

(2014) NANOTECHNOLOGY. 25(50).
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Ultra-low copper baths for sub-35 nm copper interconnects

Tanya Atanasova (UGent) , L Carbonell, R Caluwaerts, Zs Tõkei, Katrien Strubbe (UGent) and PM Vereecken

(2013) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 160(12). p.3255-3259
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Copper plating on resistive substrates, diffusion barrier and alternative seed layers

A Radisic, Magi Margalit Nagar (UGent) , Katrien Strubbe (UGent) , S Armini, Z El-Mekki, H Volders, W Ruythooren and PM Vereecken

(2010) ECS Transactions. 25(27). p.175-184
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- Journal Article
- A1
Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

F IACOPI, PM VEREECKEN, M SCHAEKERS, M CAYMAX, N MOELANS, B BLANPAIN, O RICHARD, Christophe Detavernier (UGent) and H GRIFFITHS

(2007) NANOTECHNOLOGY. 18(50).
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- Journal Article
- A1
The electrochemical behavior of p-type (100) GaAs in copper sulfate solution : influence of surface conditions

PM VEREECKEN, Katrien Strubbe (UGent) and Walter Gomes (UGent)

(1998) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 145(9). p.3075-3082
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- Journal Article
- A1
An improved procedure for the processing of chronoamperometric data : application to the electrodeposition of Cu upon (100) n-GaAs

PM VEREECKEN, Katrien Strubbe (UGent) and Walter Gomes (UGent)

(1997) JOURNAL OF ELECTROANALYTICAL CHEMISTRY. 433(1-2). p.19-31
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- Journal Article
- A1
Electrochemical behaviour of (1 0 0) GaAs in copper(II)-containing solutions

PM VEREECKEN, Fernand Vanden Kerchove and Walter Gomes (UGent)

(1996) ELECTROCHIMICA ACTA. 41(1). p.95-107

Academic Bibliography

Plasma-enhanced atomic layer deposition of zinc phosphate

Towards metal-organic framework based field effect chemical sensors: UiO-66-NH2 for nerve agent detection

The effect of polyether suppressors on the nucleation and growth of copper on RuTa seeded substrate for direct copper plating

Nanostructured TiO2/carbon nanosheet hybrid electrode for high-rate thin-film lithium-ion batteries

Ultra-low copper baths for sub-35 nm copper interconnects

Copper plating on resistive substrates, diffusion barrier and alternative seed layers

Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

The electrochemical behavior of p-type (100) GaAs in copper sulfate solution : influence of surface conditions

An improved procedure for the processing of chronoamperometric data : application to the electrodeposition of Cu upon (100) n-GaAs

Electrochemical behaviour of (1 0 0) GaAs in copper(II)-containing solutions

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