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Low temperature anneal of electron irradiation induced defects in p type silicon.
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Study of point defects in silicon by means of positron annihilation with core electrons
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Influence of oxygen and carbon on the generation and annihilation of radiation defects in silicon.
(1996) MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY. 36(1-3). p.196-199 -
LOW-TEMPERATURE ANNEAL OF THE DIVACANCY IN P-TYPE SILICON - A TRANSFORMATION FROM V-2 TO VXOY COMPLEXES.
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On the behaviour of the divacancy in silicon during anneals between 200 and 350 degrees C.
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GENERATION AND ANNEALING BEHAVIOR OF MEV PROTON AND CF-252 IRRADIATION-INDUCED DEEP LEVELS IN SILICON DIODES.
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FAST DEGRADATION OF BORON-DOPED STRAINED SI(1-X)GEX LAYERS BY 1-MEV ELECTRON-IRRADIATION.
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1 MEV ELECTRON-IRRADIATION INDUCED DEGRADATION OF BORON-DOPED STRAINED SI1-XGEX LAYERS.
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Study of electrically active lattice defects in Cf-252 and proton irradiated silicon diodes