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Influence of the target composition on the discharge voltage during magnetron sputtering
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The d.c. magnetron sputtering behavior of TiO2-x targets with added Fe2O3 or Nd2O3
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The d.c. magnetron sputtering behavior of TiO2-x targets with added Fe2O3 or Nd2O3
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Effect of the oxyzen deficiency of ceramic TiO2-x targets on the deposition of TiO2 thin films by DC magnetron sputtering
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V2O5 thin films deposited by means of d.c. magnetron sputtering from ceramic V2O3 targets.
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TiO2 films prepared by DC magnetron sputtering from ceramic targets.
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Electronic and optical characterisation of TiO2 films deposited from ceramic targets.
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Crystallization of yttria under hydrothermal conditions.