Ghent University Academic Bibliography

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Precise optical characterization of SiGe thin films for next generation transistor metrology

Samira Naghdi, Richard Ciesielski, Roger Loo (UGent) , Janusz Bogdanowicz, Victor Soltwisch and Frank Scholze

(2025) 40th European Mask and Lithography Conference (EMLC 2025). In Proceedings of SPIE 13787(137870T).
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Determination of optical constants of thin films in the EUV

Richard Ciesielski, Qais Saadeh, Vicky Philipsen, Karl Opsomer, Jean-Philippe Soulie, Meiyi Wu, Philipp Naujok, Robbert W. E. van de Kruijs, Christophe Detavernier (UGent) , Michael Kolbe, et al.

(2022) APPLIED OPTICS. 61(8). p.2060-2078
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- Journal Article
- A2
- open access
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

Meiyi Wu, Jean-Francois de Marneffe, Karl Opsomer (UGent) , Christophe Detavernier (UGent) , Annelies Delabie, Philipp Naujok, Oezge Caner, Andy Goodyear, Mike Cooke, Qais Saadeh, et al.

(2021) MICRO AND NANO ENGINEERING. 12.
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- Journal Article
- A1
- open access
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Vu Luong, Vicky Philipsen, Karl Opsomer, Jens Rip, Eric Hendrickx, Marc Heyns, Christophe Detavernier (UGent) , Christian Laubis and Frank Scholze

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 37(6).
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- Journal Article
- A1
- open access
Ni-Al alloys as alternative EUV mask absorber

Vu Luong, Vicky Philipsen, Eric Hendrickx, Karl Opsomer, Christophe Detavernier (UGent) , Christian Laubis, Frank Scholze and Marc Heyns

(2018) APPLIED SCIENCES-BASEL. 8(4).
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Novel EUV mask absorber evaluation in support of next-generation EUV imaging

Vicky Philipsen, Kim Vu Luong, Karl Opsomer, Christophe Detavernier (UGent) , Eric Hendrickx, Andreas Erdmann, Peter Evanschitzky, Robbert WE van de Kruijs, Zahra Heidarnia-Fathabad, Frank Scholze, et al.

(2018) Photomask technology 2018. In Proceedings of SPIE 10810.

Academic Bibliography

Precise optical characterization of SiGe thin films for next generation transistor metrology

Determination of optical constants of thin films in the EUV

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Ni-Al alloys as alternative EUV mask absorber

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

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