Ghent University Academic Bibliography

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Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2020) SURFACE & COATINGS TECHNOLOGY. 399.
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- Journal Article
- A1
- open access
Modeling reactive magnetron sputtering : opportunities and challenges

Diederik Depla (UGent) , Koen Strijckmans (UGent) , Dulmaa Altangerel (UGent) , Florian Cougnon, Robin Dedoncker, Roeland Schelfhout (UGent) , Isabella Schramm (UGent) , Filip Moens and Roger De Gryse (UGent)

(2019) THIN SOLID FILMS. 688.
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Anomalous effects in the aluminum oxide sputtering yield

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2018) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 51(15).
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- Conference Paper
- C3
- open access
The (in)stability of process control mechanisms in reactive DC sputtering deposition

Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) and Diederik Depla (UGent)

(2018) Plasma Surface Engineering, 16th International conference, Abstracts.
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Tutorial: Hysteresis during the reactive magnetron sputtering process

Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) and Diederik Depla (UGent)

(2018) JOURNAL OF APPLIED PHYSICS. 124(24).
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An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2018) SURFACE & COATINGS TECHNOLOGY. 353. p.231-236
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- Conference Paper
- C3
- open access
On the cause of a double hysteresis during reactive magnetron sputtering

Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) and Diederik Depla (UGent)

(2017)
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- Conference Paper
- C3
- open access
Reactive (HiPIMS) through the eyes of a 'simple' model

Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) , Filip Moens and Diederik Depla (UGent)

(2017) Reactive Sputter Deposition, 16th International symposium, Abstracts.
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- Conference Paper
- C3
- open access
Highlights in modeling the reactive magnetron sputtering process

Koen Strijckmans (UGent) , Roeland Schelfhout, Florian Cougnon and Diederik Depla (UGent)

(2017) PE2 conference, Abstracts.
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- Journal Article
- A1
- open access
The existence of a double S-shaped process curve during reactive magnetron sputtering

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2016) APPLIED PHYSICS LETTERS. 109(11).

Academic Bibliography

Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Modeling reactive magnetron sputtering : opportunities and challenges

Anomalous effects in the aluminum oxide sputtering yield

The (in)stability of process control mechanisms in reactive DC sputtering deposition

Tutorial: Hysteresis during the reactive magnetron sputtering process

An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

On the cause of a double hysteresis during reactive magnetron sputtering

Reactive (HiPIMS) through the eyes of a 'simple' model

Highlights in modeling the reactive magnetron sputtering process

The existence of a double S-shaped process curve during reactive magnetron sputtering

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