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Semiconductor-metal transition in ALD deposited vanadium oxide thin films and nanoparticles
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Defect engineering for shallow n-type junctions in germanium : facts and fiction
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Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
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Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
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Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures
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Atomic layer deposition of ruthenium at 100 °C using the RuO4-precursor and H2
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Plasma enhanced atomic layer deposition of ruthenium below 100°C using RuO4 and H2-plasma
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Low temperature thermal and plasma enhanced atomic layer deposition of ruthenium using RuO4 and H2/H2-plasma
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Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H-2-plasma
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Metal-insulator transition in ALD VO2 ultrathin films and nanoparticles: morphological control