Ghent University Academic Bibliography

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Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

Matthias Minjauw (UGent) , Ji-Yu Feng, Timo Sajavaara, Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2022) DALTON TRANSACTIONS. 51(28). p.10721-10727
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A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

Li'ao Cao (UGent) , Felix Mattelaer (UGent) , Timo Sajavaara, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2020) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 38(2).
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The co-reactant role during plasma enhanced atomic layer deposition of palladium

Ji-Yu Feng, Matthias Minjauw (UGent) , Ranjith Karuparambil Ramachandran (UGent) , Michiel Van Daele, Hilde Poelman (UGent) , Timo Sajavaara, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2020) PHYSICAL CHEMISTRY CHEMICAL PHYSICS. 22(16). p.9124-9136
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Atomic layer deposition of localized boron- and hydrogen-doped aluminum oxide using trimethyl borate as a dopant precursor

Felix Mattelaer (UGent) , Michiel Van Daele, Matthias Minjauw (UGent) , Mikko Nisula (UGent) , Simon D. Elliott, Timo Sajavaara, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2020) CHEMISTRY OF MATERIALS. 32(10). p.4152-4165
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Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

Fatemeh SM Hashemi, Li'ao Cao (UGent) , Felix Mattelaer (UGent) , Timo Sajavaara, J Ruud van Ommen and Christophe Detavernier (UGent)

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 37(4).
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Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor

Felix Mattelaer (UGent) , Michiel Van Daele, Matthias Minjauw (UGent) , Timo Sajavaara, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2019) EuroCVD 22 - Baltic ALD 16, Conference abstracts.
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Low-temperature molecular layer deposition using monofunctional aromatic precursors and ozone-based ring-opening reactions

Laura Svärd, Matti Putkonen, Eija Kenttä, Timo Sajavaara, Fabian Krahl, Maarit Karppinen, Kevin Van de Kerckhove, Christophe Detavernier (UGent) and Pekka Simell

(2017) LANGMUIR. 33(38). p.9657-9665

Academic Bibliography

Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

The co-reactant role during plasma enhanced atomic layer deposition of palladium

Atomic layer deposition of localized boron- and hydrogen-doped aluminum oxide using trimethyl borate as a dopant precursor

Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor

Low-temperature molecular layer deposition using monofunctional aromatic precursors and ozone-based ring-opening reactions

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