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Determination of optical constants of thin films in the EUV
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- Journal Article
- A2
- open access
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
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- Journal Article
- A1
- open access
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
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Mask absorber development to enable next-generation EUVL
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- Journal Article
- A1
- open access
Ni-Al alloys as alternative EUV mask absorber
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Novel EUV mask absorber evaluation in support of next-generation EUV imaging