Ghent University Academic Bibliography

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Determination of optical constants of thin films in the EUV

Richard Ciesielski, Qais Saadeh, Vicky Philipsen, Karl Opsomer, Jean-Philippe Soulie, Meiyi Wu, Philipp Naujok, Robbert W. E. van de Kruijs, Christophe Detavernier (UGent) , Michael Kolbe, et al.

(2022) APPLIED OPTICS. 61(8). p.2060-2078
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- Journal Article
- A2
- open access
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

Meiyi Wu, Jean-Francois de Marneffe, Karl Opsomer (UGent) , Christophe Detavernier (UGent) , Annelies Delabie, Philipp Naujok, Oezge Caner, Andy Goodyear, Mike Cooke, Qais Saadeh, et al.

(2021) MICRO AND NANO ENGINEERING. 12.
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- A1
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Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Vu Luong, Vicky Philipsen, Karl Opsomer, Jens Rip, Eric Hendrickx, Marc Heyns, Christophe Detavernier (UGent) , Christian Laubis and Frank Scholze

(2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 37(6).
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Mask absorber development to enable next-generation EUVL

Vicky Philipsen, Kim Vu Luong, Karl Opsomer, Laurent Souriau, Jens Rip, Christophe Detavernier (UGent) , Andreas Erdmann, Peter Evanschitzky, Christian Laubis, Philipp Hoenicke, et al.

(2019) XXVI SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY (PHOTOMASK JAPAN 2019). In Proceedings of SPIE 11178.
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Ni-Al alloys as alternative EUV mask absorber

Vu Luong, Vicky Philipsen, Eric Hendrickx, Karl Opsomer, Christophe Detavernier (UGent) , Christian Laubis, Frank Scholze and Marc Heyns

(2018) APPLIED SCIENCES-BASEL. 8(4).
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Novel EUV mask absorber evaluation in support of next-generation EUV imaging

Vicky Philipsen, Kim Vu Luong, Karl Opsomer, Christophe Detavernier (UGent) , Eric Hendrickx, Andreas Erdmann, Peter Evanschitzky, Robbert WE van de Kruijs, Zahra Heidarnia-Fathabad, Frank Scholze, et al.

(2018) Photomask technology 2018. In Proceedings of SPIE 10810.

Academic Bibliography

Determination of optical constants of thin films in the EUV

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Mask absorber development to enable next-generation EUVL

Ni-Al alloys as alternative EUV mask absorber

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

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