Ghent University Academic Bibliography

Your filters: cql: author="Mocuta, Cristian" or (type any "bookEditor issueEditor" and editor="Mocuta, Cristian")

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- Journal Article
- A1
- open access
Characterization of nanoparticle and thin-film texture : pole-figure measurements in grazing-incidence configuration

Arno Depoorter (UGent) , Eduardo Solano Minuesa (UGent) , Cristian Mocuta, Zhang Zhiwei (UGent) , Jolien Dendooven (UGent) , Christophe Detavernier (UGent) and Matthias Filez (UGent)

(2026) JOURNAL OF APPLIED CRYSTALLOGRAPHY. 59(1). p.108-116
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- Conference Paper
- C3
Ultrathin epitaxial silicides for semiconductor contacts

Filip Geenen (UGent) , Cristian Mocuta and Christophe Detavernier (UGent)

(2017) ECS Meeting abstracts.
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Axiotaxy in oxide heterostructures : preferential orientation of BaCeO3 nanoparticles embedded in superconducting YBa2Cu3O7-δ thin films

Eduardo Solano Minuesa (UGent) , Filip Geenen (UGent) , Teresa Puig, Xavier Obradors, Cristian Mocuta and Christophe Detavernier (UGent)

(2017) THIN SOLID FILMS. 638. p.105-113
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- Conference Paper
- C3
- open access
On the inheritance of crystallographic texture during the nickel silicide solid-phase reaction

Filip Geenen (UGent) , Eduardo Solano Minuesa (UGent) , Cristian Mocuta, Jean Jordan-Sweet, Christian Lavoie and Christophe Detavernier (UGent)

(2017) Materials for Advanced Metallization, Conference abstracts.
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- Conference Paper
- C3
Formation of nickel silicides in the ultra-thin film regime (<10nm)

Filip Geenen (UGent) , Eduardo Solano Minuesa (UGent) , Cristian Mocuta and Christophe Detavernier (UGent)

(2016) MAM 2016 Materials for Advanced Metallization, Abstracts.

Academic Bibliography

Characterization of nanoparticle and thin-film texture : pole-figure measurements in grazing-incidence configuration

Ultrathin epitaxial silicides for semiconductor contacts

Axiotaxy in oxide heterostructures : preferential orientation of BaCeO3 nanoparticles embedded in superconducting YBa2Cu3O7-δ thin films

On the inheritance of crystallographic texture during the nickel silicide solid-phase reaction

Formation of nickel silicides in the ultra-thin film regime (<10nm)

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