Show
Sort by
-
Mechanism of in-plane alignment in magnetron sputtered biaxially aligned yttria-stabilized zirconia
-
Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering
-
Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering
-
Growth mechanism of biaxially aligned magnesium oxide deposited by unbalanced magnetron sputtering
-
Influence of the Ar/O-2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering
-
Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers
-
Characterization of oxide precipitates in heavily B-doped silicon by infrared spectroscopy
-
Aluminum incorporation into MCM-48 toward the creation of Bronsted acidity
-
The influence of the alcohol concentration on the structural ordering of mesoporous silica : cosurfactant versus cosolvent