Ghent University Academic Bibliography

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Tunability of near infrared opto-synaptic properties of thin MoO3 films fabricated by atomic layer deposition

Hongyan Xu, Mohammad Karbalaei Akbari (UGent) , Siyan Wang, Shuhang Chen, Eugene Kats, Francis Verpoort, Jieqi Hu (UGent) and Serge Zhuiykov (UGent)

(2022) APPLIED SURFACE SCIENCE. 593.
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Ultra-thin sub-10 nm Ga2O3-WO3 heterostructures developed by atomic layer deposition for sensitive and selective C2H5OH detection on ppm level

Zihan Wei, Mohammad Karbalaei Akbari (UGent) , Zhenyin Hai, Ranjith Karuparambil Ramachandran (UGent) , Christophe Detavernier (UGent) , Francis Verpoort (UGent) , Eugene Kats, Hongyan Xu, Jie Hu and Serge Zhuiykov (UGent)

(2019) SENSORS AND ACTUATORS B-CHEMICAL. 287. p.147-156
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Atomic layer deposition of ultra-thin oxide semiconductors : challenges and opportunities

Serge Zhuiykov (UGent) , Zhenyin Hai, Eugene Kats, Mohammad Karbalaei Akbari (UGent) and Chenyang Xue

(2017) Advanced materials research VII. In Key Engineering Materials 735. p.215-218
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Highly sensitive, fast-responding, and stable photodetector based on ALD-developed monolayer TiO2

Mohammad Karbalaei Akbari (UGent) , Zhenyin Hai, Stephen Depuydt (UGent) , Eugene Kats, Jie Hu and Serge Zhuiykov (UGent)

(2017) IEEE TRANSACTIONS ON NANOTECHNOLOGY. 16(5). p.880-887
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Atomic layer deposition-enabled single layer of tungsten trioxide across a large area

Serge Zhuiykov (UGent) , Lachlan Hyde, Zhenyin Hai, Mohammad Karbalaei Akbari (UGent) , Eugene Kats, Christophe Detavernier (UGent) , Chenyang Xue and Hongyan Xu

(2017) APPLIED MATERIALS TODAY. 6. p.44-53

Academic Bibliography

Tunability of near infrared opto-synaptic properties of thin MoO3 films fabricated by atomic layer deposition

Ultra-thin sub-10 nm Ga2O3-WO3 heterostructures developed by atomic layer deposition for sensitive and selective C2H5OH detection on ppm level

Atomic layer deposition of ultra-thin oxide semiconductors : challenges and opportunities

Highly sensitive, fast-responding, and stable photodetector based on ALD-developed monolayer TiO2

Atomic layer deposition-enabled single layer of tungsten trioxide across a large area

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