Show 10 5 10 15 20 50 100 250 Sort by year (new to old) Actions Download search results Subscribe to news feed Your filters: cql: author="Delvaux, C" or (type any "bookEditor issueEditor" and editor="Delvaux, C") Add to list Conference Paper P1 Bottom-ARC optimization methodology for 0.25 mu m lithography and beyond Maaike Op de Beeck (UGent) , G Vandenberghe, P Jaenen, FH Zhang, C Delvaux, P Richardson, I van Puyenbroeck, K Ronse, JE Lamb, JBC van der Hilst, et al. (1998) OPTICAL MICROLITHOGRAPHY XI. In ARRAY(0x86f7508) 3334. p.322-336