Ghent University Academic Bibliography

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- Conference Paper
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Precise optical characterization of SiGe thin films for next generation transistor metrology

Samira Naghdi, Richard Ciesielski, Roger Loo (UGent) , Janusz Bogdanowicz and Victor Soltwisch

(2025) 40th European Mask and Lithography Conference (EMLC 2025), Abstracts. p.136-139
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Precise optical characterization of SiGe thin films for next generation transistor metrology

Samira Naghdi, Richard Ciesielski, Roger Loo (UGent) , Janusz Bogdanowicz, Victor Soltwisch and Frank Scholze

(2025) 40th European Mask and Lithography Conference (EMLC 2025). In Proceedings of SPIE 13787(137870T).
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- Journal Article
- A1
- open access
Interface sharpness in stacked thin film structures : a comparison of soft X-ray reflectometry and transmission electron microscopy

Richard Ciesielski, Janusz Bogdanowicz, Roger Loo (UGent) , Yosuke Shimura, Antonio Mani, Christoph Mitterbauer, Michael Kolbe and Victor Soltwisch

(2024) JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3. 23(4).
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- Conference Paper
- P1
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Soft x-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures

Richard Ciesielski, Roger Loo (UGent) , Yosuke Shimura, Janusz Bogdanowicz, Antonio Mani, Christoph Mitterbauer, Vinh-Binh Truong, Michael Kolbe and Victor Soltwisch

(2024) METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII. In Proceedings of SPIE 12955.
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Determination of optical constants of thin films in the EUV

Richard Ciesielski, Qais Saadeh, Vicky Philipsen, Karl Opsomer, Jean-Philippe Soulie, Meiyi Wu, Philipp Naujok, Robbert W. E. van de Kruijs, Christophe Detavernier (UGent) , Michael Kolbe, et al.

(2022) APPLIED OPTICS. 61(8). p.2060-2078

Academic Bibliography

Precise optical characterization of SiGe thin films for next generation transistor metrology

Precise optical characterization of SiGe thin films for next generation transistor metrology

Interface sharpness in stacked thin film structures : a comparison of soft X-ray reflectometry and transmission electron microscopy

Soft x-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures

Determination of optical constants of thin films in the EUV

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