Ghent University Academic Bibliography

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Precise optical characterization of SiGe thin films for next generation transistor metrology

Samira Naghdi, Richard Ciesielski, Roger Loo (UGent) , Janusz Bogdanowicz and Victor Soltwisch

(2025) 40th European Mask and Lithography Conference (EMLC 2025), Abstracts. p.136-139
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Precise optical characterization of SiGe thin films for next generation transistor metrology

Samira Naghdi, Richard Ciesielski, Roger Loo (UGent) , Janusz Bogdanowicz, Victor Soltwisch and Frank Scholze

(2025) 40TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, EMLC 2025. In Proceedings of SPIE 13787(137870T).
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Inline X-ray metrology for Complementary Field-Effect Transistors (CFET)

Janusz Bogdanowicz, Andrea Mingardi, Vincent Brissonneau, Roger Loo (UGent) , Yosuke Shimura, Anjani Akula, Pallavi P. Gowda, Daisy Zhou, Naoto Horiguchi, Serge Biesemans, et al.

(2025) METROLOGY, INSPECTION, AND PROCESS CONTROL XXXIX. In Proceedings of SPIE 13426.
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3D-DRAM Si/SiGe superlattices : inspection strategies and evaluation

Matteo Beggiato, Roger Loo (UGent) , Sun Wei, Alain Moussa, Gerhard Bast, Kaoru Fukaya, Dorin Cerbu, Nachiketa Janardan, Konstantin Chirko, Han Han, et al.

(2025) METROLOGY, INSPECTION, AND PROCESS CONTROL XXXIX. In Proceedings of SPIE 13426.
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Interface sharpness in stacked thin film structures : a comparison of soft X-ray reflectometry and transmission electron microscopy

Richard Ciesielski, Janusz Bogdanowicz, Roger Loo (UGent) , Yosuke Shimura, Antonio Mani, Christoph Mitterbauer, Michael Kolbe and Victor Soltwisch

(2024) JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3. 23(4).
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Soft x-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures

Richard Ciesielski, Roger Loo (UGent) , Yosuke Shimura, Janusz Bogdanowicz, Antonio Mani, Christoph Mitterbauer, Vinh-Binh Truong, Michael Kolbe and Victor Soltwisch

(2024) METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII. In Proceedings of SPIE 12955.
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Detection of crystalline defects in Si/SiGe superlattices towards 3D-DRAM applications

Matteo Beggiato, Dorin Cerbu, Roger Loo (UGent) , Wei Sun, Alain Moussa, Gerhard Bast, Kaoru Fukaya, Christophe Beral, Anne-Laure Charley, Nachiketa Janardan, et al.

(2024) Metrology, Inspection, and Process Control XXXVIII. In Proceedings of SPIE 12955.
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Epitaxial Si/SiGe multi-stacks : from stacked nano-sheet to fork-sheet and CFET devices

Roger Loo (UGent) , Anjani Akula, Yosuke Shimura, Clement Porret, Erik Rosseel, Thomas Dursap, Andriy Yakovitch Hikavyy, Matteo Beggiato, Janusz Bogdanowicz, Alex Merkulov, et al.

(2024) ECS TRANSACTIONS. 114(2). p.15-28

Academic Bibliography

Precise optical characterization of SiGe thin films for next generation transistor metrology

Precise optical characterization of SiGe thin films for next generation transistor metrology

Inline X-ray metrology for Complementary Field-Effect Transistors (CFET)

3D-DRAM Si/SiGe superlattices : inspection strategies and evaluation

Interface sharpness in stacked thin film structures : a comparison of soft X-ray reflectometry and transmission electron microscopy

Soft x-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures

Detection of crystalline defects in Si/SiGe superlattices towards 3D-DRAM applications

Epitaxial Si/SiGe multi-stacks : from stacked nano-sheet to fork-sheet and CFET devices

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