Ghent University Academic Bibliography

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SiGe:B Source/Drain epitaxy for advanced device applications

T. Dursap, C. Porret, E. Rosseel, A. Akula, A. Pondini, H. Mertens, J. Ganguly, R. Sarkar, N. Horiguchi, R. Langer, et al.

(2025) European Conference on Innovative and Advanced Epitaxy, Abstracts. p.43-43
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- Miscellaneous
JST / ASPIRE project versatile quantum engineering of group-IV alloy materials for semiconductor heterogeneous integrated devices : Imec’s involvement

Roger Loo (UGent) , Y. Shimura, H. Kuwazuru, K. Yamamoto, D. Wang, C. Porret, T. Dursap, A. Akula, D. Schippers, O. Nakatsuka, et al.

(2025) p.1-2
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Inline X-ray metrology for complementary field-effect transistors (CFET)

J. Bogdanowicz, A. Mingardi, V. Brissonneau, Roger Loo (UGent) , Y. Shimura, A. Akula, P. P. Gowda, D. Zhou, N. Horiguchi, S. Biesemans, et al.

(2025) SPIE Advanced Lithography and Patterning Conference : Metrology, Inspection, and Process Control XXXIX, Abstracts.
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- Journal Article
- A1
- open access
Epitaxial Si/SiGe multi-stacks : from stacked nano-sheet to fork-sheet and CFET devices

Roger Loo (UGent) , A. Akula, Y. Shimura, C. Porret, E. Rosseel, T. Dursap, A. Y. Hikavyy, M. Beggiato, J. Bogdanowicz, A. Merkulov, et al.

(2025) ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. 14(1).
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- Conference Paper
- C3
- open access
DLTS assessment of grown-in defects in hetero-epitaxial gate stacks for stacked silicon nanosheet channels

Eddy Simoen (UGent) , Samira Khelifi (UGent) , Henk Vrielinck (UGent) , A. Akula and Roger Loo (UGent)

(2024) GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY XX.
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- Conference Paper
- C3
- open access
Complementary Field-Effect Transistors (CFET) : metrology challenges and solutions

J. Bogdanowicz, A.-L. Charley, M. Saib, M. Beggiato, G. Lorusso, V. Brissonneau, E. Dupuy, Roger Loo (UGent) , Y. Shimura, A. Akula, et al.

(2024) International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN 2024), Abstracts.

Academic Bibliography

SiGe:B Source/Drain epitaxy for advanced device applications

JST / ASPIRE project versatile quantum engineering of group-IV alloy materials for semiconductor heterogeneous integrated devices : Imec’s involvement

Inline X-ray metrology for complementary field-effect transistors (CFET)

Epitaxial Si/SiGe multi-stacks : from stacked nano-sheet to fork-sheet and CFET devices

DLTS assessment of grown-in defects in hetero-epitaxial gate stacks for stacked silicon nanosheet channels

Complementary Field-Effect Transistors (CFET) : metrology challenges and solutions

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