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- Journal Article
- A1
- open access
Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layers
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- Journal Article
- A2
- open access
Microwave-assisted synthesis of nanoscale VO2 structures
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- Conference Paper
- C3
- open access
Area-selective growth and nucleation enhancement during Ru ALD using the RuO4 precursor and H2-gas
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- Journal Article
- A1
- open access
Nucleation enhancement and area-selective atomic layer deposition of ruthenium using RuO4 and H2 gas
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- Conference Paper
- C3
- open access
Chemical selectivity and nucleation during ALD of Ru with the RuO4 precursor
(2019) -
Stabilizing fluoride phosphors : surface modification by atomic layer deposition
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Inherent substrate selectivity and nucleation enhancement during Ru ALD using the RuO4-precursor and H2-gas
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- Journal Article
- A1
- open access
Thickness characterization toolbox for transparent protective coatings on polymer substrates
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Synthesis and surface chemistry of mechanoluminescent nanocrystals for timely detection of damage
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Inherent area-selective growth and nucleation enhancement during Ru ALD using the RuO4-precursor and H2-gas