Ghent University Academic Bibliography

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Atomic layer deposition of ruthenium dioxide based on redox reactions between alcohols and ruthenium tetroxide

Nithin Poonkottil, Matthias Minjauw (UGent) , Andreas Werbrouck (UGent) , Stefano Checchia, Eduardo Solano, Mikko Nisula (UGent) , Alexis Franquet, Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2022) CHEMISTRY OF MATERIALS. 34(19). p.8946-8958
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Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

Matthias Minjauw (UGent) , Ji-Yu Feng, Timo Sajavaara, Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2022) DALTON TRANSACTIONS. 51(28). p.10721-10727
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Creation of gallium acid and platinum metal sites in bifunctional zeolite hydroisomerization and hydrocracking catalysts by atomic layer deposition

Lisa Geerts, Ranjith Karuparambil Ramachandran (UGent) , Jolien Dendooven (UGent) , Sambhu Radhakrishnan, Jin Won Seo, Christophe Detavernier (UGent) , Johan Martens and Sreeprasanth Pulinthanathu Sree

(2020) CATALYSIS SCIENCE & TECHNOLOGY. 10(6). p.1778-1788
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Atomic layer deposition of Al2O3 using aluminum triisopropoxide (ATIP) : a combined experimental and theoretical study

Ba Tai Truong (UGent) , Li'ao Cao (UGent) , Felix Mattelaer (UGent) , Geert Rampelberg (UGent) , Fatemeh SM Hashemi, Jolien Dendooven (UGent) , J Ruud van Ommen, Christophe Detavernier (UGent) and Marie-Françoise Reyniers (UGent)

(2019) JOURNAL OF PHYSICAL CHEMISTRY C. 123(1). p.485-494
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Tutorial: Hysteresis during the reactive magnetron sputtering process

Koen Strijckmans (UGent) , Roeland Schelfhout and Diederik Depla (UGent)

(2018) JOURNAL OF APPLIED PHYSICS. 124(24).
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Molecular layer deposition using ring-opening reactions : molecular modeling of the film growth and the effects of hydrogen peroxide

Laura Keskiväli, Matti Putkonen, Eini Puhakka, Eija Kentta, Jeroen Kint, Ranjith Karuparambil Ramachandran (UGent) , Christophe Detavernier (UGent) and Pekka Simell

(2018) ACS OMEGA. 3(7). p.7141-7149
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Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material

Thomas Dobbelaere (UGent) , Felix Mattelaer (UGent) , Philippe M Vereecken and Christophe Detavernier (UGent)

(2017) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 35(4).
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Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries

Thomas Dobbelaere (UGent) , Felix Mattelaer (UGent) , Amit Kumar Roy (UGent) , Philippe Vereecken and Christophe Detavernier (UGent)

(2017) JOURNAL OF MATERIALS CHEMISTRY A. 5(1). p.330-338
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Plasma-enhanced atomic layer deposition of iron phosphate as a positive electrode for 3D lithium-ion microbatteries

Thomas Dobbelaere (UGent) , Felix Mattelaer (UGent) , Jolien Dendooven (UGent) , Philippe Vereecken and Christophe Detavernier (UGent)

(2016) CHEMISTRY OF MATERIALS. 28(10). p.3435-3445
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Hysteresis behavior during facing target magnetron sputtering

Florian Cougnon, Koen Strijckmans (UGent) , Roeland Schelfhout and Diederik Depla (UGent)

(2016) SURFACE & COATINGS TECHNOLOGY. 294. p.215-219
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Finite element modelling of the ionic conductivity of acceptor doped ceria

Dries Van Laethem, Johan Deconinck, Diederik Depla (UGent) and Annick Hubin

(2016) JOURNAL OF THE EUROPEAN CERAMIC SOCIETY. 36(8). p.1983-1994
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In situ time-lapse synchrotron radiation X-ray diffraction of silver corrosion

Rita Wiesinger, Rosie Grayburn (UGent) , Mark Dowsett, Pieter-Jan Sabbe (UGent) , Paul Thompson, Mieke Adriaens (UGent) and Manfred Schreiner

(2015) JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY. 30(3). p.694-701
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Atomic layer deposited second-order nonlinear optical metamaterial for back-end integration with CMOS-compatible nanophotonic circuitry

Stéphane Clemmen (UGent) , Artur Hermans (UGent) , Eduardo Solano Minuesa (UGent) , Jolien Dendooven (UGent) , Kalle Koskinen, Martti Kauranen, Edouard Brainis (UGent) , Christophe Detavernier (UGent) and Roel Baets (UGent)

(2015) OPTICS LETTERS. 40(22). p.5371-5374
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DFT investigation into alumina ALD growth inhibition on hydroxylated amorphous silica surface

Aditya Shankar Sandupatla (UGent) , Konstantinos Alexopoulos (UGent) , Marie-Françoise Reyniers (UGent) and Guy Marin (UGent)

(2015) JOURNAL OF PHYSICAL CHEMISTRY C. 119(32). p.18380-18388
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Low temperature atomic layer deposition of crystalline In2O3 films

Ranjith Karuparambil Ramachandran (UGent) , Jolien Dendooven (UGent) , Hilde Poelman (UGent) and Christophe Detavernier (UGent)

(2015) JOURNAL OF PHYSICAL CHEMISTRY C. 119(21). p.11786-11791
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Ab initio investigation of surface chemistry of alumina ALD on hydroxylated γ-alumina surface

Aditya Shankar Sandupatla (UGent) , Konstantinos Alexopoulos (UGent) , Marie-Françoise Reyniers (UGent) and Guy Marin (UGent)

(2015) JOURNAL OF PHYSICAL CHEMISTRY C. 119(23). p.13050-13061
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Solution derived ZnO:Al films with low resistivity

K Schellens, Boris Capon (UGent) , C De Dobbelaere, Christophe Detavernier (UGent) , A Hardy and MK Van Bael

(2012) THIN SOLID FILMS. 524. p.81-85
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Aqueous chemical solution deposition of lanthanum zirconate and related lattice-matched single buffer layers suitable for YBCO coated conductors: a review

Vyshnavi Narayanan and Isabel Van Driessche (UGent)

(2012) PROGRESS IN SOLID STATE CHEMISTRY. 40(4). p.57-77
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Compositional effects on the growth of Mg(M)O films

Marta Martins Saraiva (UGent) , Violeta Georgieva, Stijn Mahieu (UGent) , Koen Van Aeken (UGent) , Annemie Bogaerts and Diederik Depla (UGent)

(2010) JOURNAL OF APPLIED PHYSICS. 107(3).
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Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

Jan Musschoot, Davy Deduytsche (UGent) , Hilde Poelman (UGent) , Johan Haemers (UGent) , Roland Vanmeirhaeghe (UGent) , Sven Van den Berghe and Christophe Detavernier (UGent)

(2009) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 156(7). p.P122-P126
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Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering

Stijn Mahieu (UGent) , Pieter Ghekiere, Griet De Winter, Roger De Gryse (UGent) , Diederik Depla (UGent) and OI Lebedev

(2005) SOLID STATE PHENOMENA. 105. p.447-452

Academic Bibliography

Atomic layer deposition of ruthenium dioxide based on redox reactions between alcohols and ruthenium tetroxide

Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

Creation of gallium acid and platinum metal sites in bifunctional zeolite hydroisomerization and hydrocracking catalysts by atomic layer deposition

Atomic layer deposition of Al2O3 using aluminum triisopropoxide (ATIP) : a combined experimental and theoretical study

Tutorial: Hysteresis during the reactive magnetron sputtering process

Molecular layer deposition using ring-opening reactions : molecular modeling of the film growth and the effects of hydrogen peroxide

Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material

Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries

Plasma-enhanced atomic layer deposition of iron phosphate as a positive electrode for 3D lithium-ion microbatteries

Hysteresis behavior during facing target magnetron sputtering

Finite element modelling of the ionic conductivity of acceptor doped ceria

In situ time-lapse synchrotron radiation X-ray diffraction of silver corrosion

Atomic layer deposited second-order nonlinear optical metamaterial for back-end integration with CMOS-compatible nanophotonic circuitry

DFT investigation into alumina ALD growth inhibition on hydroxylated amorphous silica surface

Low temperature atomic layer deposition of crystalline In2O3 films

Ab initio investigation of surface chemistry of alumina ALD on hydroxylated γ-alumina surface

Solution derived ZnO:Al films with low resistivity

Aqueous chemical solution deposition of lanthanum zirconate and related lattice-matched single buffer layers suitable for YBCO coated conductors: a review

Compositional effects on the growth of Mg(M)O films

Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering

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