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Rotatable magnetron sputtering: downscaling for better understanding
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Reactive Sputter Deposition
Diederik Depla (UGent) and Stijn Mahieu (UGent)(2008) -
Transport of sputtered particles through the gas phase
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Depositing Aluminium Oxide: a case study of recative magnetron sputtering
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Depositie van deklagen met magnetron sputteren
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Dependence of the sticking coefficient of sputtered atoms on the target-substrate distance
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Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiN
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Correlation between electron and negative O- ion emission during reactive sputtering of oxides
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Towards a more complete model for reactive magnetron sputtering
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Understanding the discharge voltage behavior during reactive sputtering of oxides
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Monte Carlo simulation of the transport of atoms in DC magnetron sputtering
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Mechanism of in-plane alignment in magnetron sputtered biaxially aligned yttria-stabilized zirconia
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Mechanism of biaxial alignment in thin films, deposited by magnetron sputtering
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Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering
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Biaxial alignment in sputter deposited thin films
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Structure evolution of the biaxial alignment in sputter-deposited MgO and Cr
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Growth mechanism of biaxially aligned magnesium oxide deposited by unbalanced magnetron sputtering
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Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers
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Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering
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Influence of the Ar/O-2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering
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Biaxially aligned YSZ layers deposited by unbalanced magnetron sputtering: a model
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Influence of the deposition parameters on the biaxial alignment of MgO grown by unbalanced magnetron sputtering
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A model for the development of biaxial alignment in yttria stabilized zirconia layers, deposited by unbalanced magnetron sputtering
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Unbalanced magnetron sputter deposition of biaxially aligned yttria stabilized zirconia and indium tin oxide thin films