Ghent University Academic Bibliography

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Sputter deposited transition metal nitrides as back electrode for CIGS solar cells

Stijn Mahieu (UGent) , Wouter Leroy (UGent) , Koen Van Aeken (UGent) , M Wolter, J Colaux, S Lucas, G Abadias, Paul Matthys (UGent) and Diederik Depla (UGent)

(2011) SOLAR ENERGY. 85(3). p.538-544
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Rotating cylindrical magnetron sputtering: simulation of the reactive process

Diederik Depla (UGent) , Xiuyang Li, Stijn Mahieu (UGent) , Koen Van Aeken (UGent) , Wouter Leroy (UGent) , Johan Haemers (UGent) , Roger De Gryse (UGent) and Annemie Bogaerts

(2010) JOURNAL OF APPLIED PHYSICS. 107(11).
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Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter deposition

Max Horkel, Koen Van Aeken (UGent) , Christophe Eisenmenger-Sittner, Diederik Depla (UGent) , Stijn Mahieu (UGent) and Wouter Leroy (UGent)

(2010) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 43(7).
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Compositional effects on the growth of Mg(M)O films

Marta Martins Saraiva (UGent) , Violeta Georgieva, Stijn Mahieu (UGent) , Koen Van Aeken (UGent) , Annemie Bogaerts and Diederik Depla (UGent)

(2010) JOURNAL OF APPLIED PHYSICS. 107(3).
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Modeling the flux of high energy negative ions during reactive magnetron sputtering

Stijn Mahieu (UGent) , Wouter Leroy (UGent) , Koen Van Aeken (UGent) and Diederik Depla (UGent)

(2009) JOURNAL OF APPLIED PHYSICS. 106(9).
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- Journal Article
- A1
Computer modelling of magnetron discharges

Annemie Bogaerts, Evi Bultinck, Ivan Kolev, Laurent Schwaederlé, Koen Van Aeken (UGent) , Guy Buyle and Diederik Depla (UGent)

(2009) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 42.
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The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation

Koen Van Aeken (UGent) , Stijn Mahieu (UGent) and Diederik Depla (UGent)

(2008) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 41(20).
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- Journal Article
- A1
Dependence of the sticking coefficient of sputtered atoms on the target-substrate distance

Stijn Mahieu (UGent) , Koen Van Aeken (UGent) , Diederik Depla (UGent) , D SMEETS and A VANTOMME

(2008) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 41(15).
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- Journal Article
- A1
Quantification of the ion and momentum fluxes toward the substrate during reactive magnetron sputtering

Stijn Mahieu (UGent) , Koen Van Aeken (UGent) and Diederik Depla (UGent)

(2008) Journal of applied physics. 104(11).

Academic Bibliography

Sputter deposited transition metal nitrides as back electrode for CIGS solar cells

Rotating cylindrical magnetron sputtering: simulation of the reactive process

Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter deposition

Compositional effects on the growth of Mg(M)O films

Modeling the flux of high energy negative ions during reactive magnetron sputtering

Computer modelling of magnetron discharges

The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation

Dependence of the sticking coefficient of sputtered atoms on the target-substrate distance

Quantification of the ion and momentum fluxes toward the substrate during reactive magnetron sputtering

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