Show
Sort by
-
Formation and texture of palladium germanides studied by in situ X-ray diffraction and pole figure measurements
-
TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition
-
- Journal Article
- A1
- open access
Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)
-
Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition
-
Texture of cobalt germanides on Ge(100) and Ge(111) and its influence on the formation temperature
-
In situ X-ray diffraction study of thin film Ir/Si solid state reactions
-
In situ x-ray diffraction study of Ni-Yb interlayer and alloy systems on Si(100)
-
In situ and ex situ investigation on the annealing performance of the ZnO film grown by ion beam deposition
-
The effects of deposition temperature and ambient on the physical and electrical performance of DC-sputtered n-ZnO/p-Si heterojunction
-
In situ study of the formation of silicide phases in amorphous Co-Si mixed layers
-
- Conference Paper
- P1
- open access
The texture of thin NiSi films and its effect on agglomeration
-
Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide
-
In situ x-ray diffraction study of metal induced crystallization of amorphous germanium
-
Ru thin film grown on TaN by plasma enhanced atomic layer deposition
-
Modeling the conformality of atomic layer deposition: the effect of sticking probability
-
- Conference Paper
- C3
- open access
Modeling the conformality of atomic layer deposition: the effect of sticking probability
-
In situ study of the formation of silicide phases in amorphous Ni-Si mixed layers
-
Metal in-diffusion during Fe and co-germanidation of germanium
-
Formation and stability of NiSi in the presence of Co and Fe alloying elements
-
- Conference Paper
- C3
- open access
Conformality of thermal and plasma enhanced ALD