Ghent University Academic Bibliography

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Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering

Josja Van Bever (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2023) APPLIED SURFACE SCIENCE. 613.
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A computational study of the double hysteresis phenomenon during reactive sputtering

Josja Van Bever (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2022) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 55(35).
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Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures

Diederik Depla (UGent) , Robin Dedoncker and Koen Strijckmans (UGent)

(2021) THIN SOLID FILMS. 732.
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Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2020) SURFACE & COATINGS TECHNOLOGY. 399.
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Modeling reactive magnetron sputtering : opportunities and challenges

Diederik Depla (UGent) , Koen Strijckmans (UGent) , Dulmaa Altangerel (UGent) , Florian Cougnon, Robin Dedoncker, Roeland Schelfhout (UGent) , Isabella Schramm (UGent) , Filip Moens and Roger De Gryse (UGent)

(2019) THIN SOLID FILMS. 688.
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The (in)stability of process control mechanisms in reactive DC sputtering deposition

Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) and Diederik Depla (UGent)

(2018) Plasma Surface Engineering, 16th International conference, Abstracts.
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Tutorial: Hysteresis during the reactive magnetron sputtering process

Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) and Diederik Depla (UGent)

(2018) JOURNAL OF APPLIED PHYSICS. 124(24).
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An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2018) SURFACE & COATINGS TECHNOLOGY. 353. p.231-236
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Anomalous effects in the aluminum oxide sputtering yield

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2018) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 51(15).
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On the cause of a double hysteresis during reactive magnetron sputtering

Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) and Diederik Depla (UGent)

(2017)
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Highlights in modeling the reactive magnetron sputtering process

Koen Strijckmans (UGent) , Roeland Schelfhout, Florian Cougnon and Diederik Depla (UGent)

(2017) PE2 conference, Abstracts.
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Reactive (HiPIMS) through the eyes of a 'simple' model

Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) , Filip Moens and Diederik Depla (UGent)

(2017) Reactive Sputter Deposition, 16th International symposium, Abstracts.
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Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

Koen Strijckmans (UGent) , Filip Moens and Diederik Depla (UGent)

(2017) JOURNAL OF APPLIED PHYSICS. 121(8).
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A modelling view on the existence of hysteresis during reactive HiPIMS

Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2016) Reactive Sputter Deposition, 15th International symposium, Abstracts.
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Hysteresis behavior during facing target magnetron sputtering

Florian Cougnon, Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) and Diederik Depla (UGent)

(2016) SURFACE & COATINGS TECHNOLOGY. 294. p.215-219
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The existence of a double S-shaped process curve during reactive magnetron sputtering

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2016) APPLIED PHYSICS LETTERS. 109(11).
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Modeling target erosion during reactive sputtering

Koen Strijckmans (UGent) and Diederik Depla (UGent)

(2015) APPLIED SURFACE SCIENCE. 133. p.185-192
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Highlights in modeling the reactive magnetron sputtering process with RSD2013

Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) , Florian Cougnon and Diederik Depla (UGent)

(2015) Reactive Sputter Deposition, 14th International symposium, Abstracts.
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On the target surface cleanness during magnetron sputtering

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) , Francis Boydens (UGent) and Diederik Depla (UGent)

(2015) APPLIED SURFACE SCIENCE. 355. p.743-747
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- PhD Thesis
- open access
Modeling the reactive magnetron sputtering process

Koen Strijckmans (UGent)

(2015)

Academic Bibliography

Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering

A computational study of the double hysteresis phenomenon during reactive sputtering

Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures

Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Modeling reactive magnetron sputtering : opportunities and challenges

The (in)stability of process control mechanisms in reactive DC sputtering deposition

Tutorial: Hysteresis during the reactive magnetron sputtering process

An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

Anomalous effects in the aluminum oxide sputtering yield

On the cause of a double hysteresis during reactive magnetron sputtering

Highlights in modeling the reactive magnetron sputtering process

Reactive (HiPIMS) through the eyes of a 'simple' model

Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

A modelling view on the existence of hysteresis during reactive HiPIMS

Hysteresis behavior during facing target magnetron sputtering

The existence of a double S-shaped process curve during reactive magnetron sputtering

Modeling target erosion during reactive sputtering

Highlights in modeling the reactive magnetron sputtering process with RSD2013

On the target surface cleanness during magnetron sputtering

Modeling the reactive magnetron sputtering process

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