Show
Sort by
-
- Journal Article
- A1
- open access
TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer
-
- PhD Thesis
- open access
Advantages and challenges of plasma enhanced atomic layer deposition
(2011) -
Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition
-
Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation