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Metal nanocatalyst sintering interrogated at complementary length scales
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Metal nanocatalyst sintering interrogated at complementary length scales (Small 5/2023)
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Synthesis and deposition of thermochromic VO2 thin films from peroxide-based chemical solutions
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- Journal Article
- A2
- open access
Microwave-assisted synthesis of nanoscale VO2 structures
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Boron extraction using selective ion exchange resins enables effective magnesium recovery from lithium rich brines with minimal lithium loss
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- Journal Article
- A1
- open access
Formation and preferential orientation of Au-free Al/Ti-based ohmic contacts on different hexagonal nitride-based heterostructures
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Kinetic and thermodynamic description of intermediary phases formation in Ti-Al system during reactive sintering
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- Journal Article
- A1
- open access
Mechanism of the Intermediary Phase Formation in Ti-20 wt. % Al Mixture during Pressureless Reactive Sintering
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- Journal Article
- A1
- open access
Thickness characterization toolbox for transparent protective coatings on polymer substrates
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- Journal Article
- A1
- open access
Formation of Ni-Ti intermetallics during reactive sintering at 800-900 °C
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Investigation of the effect of magnesium on the microstructure and mechanical properties of NiTi shape memory alloy prepared by self-propagating high-temperature synthesis
(2017) METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE. 48A(7). p.3559-3569 -
Ternary silicide formation from Ni-Pt, Ni-Pd and Pt-Pd alloys on Si(100) : nucleation and solid solubility of the monosilicides
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- Journal Article
- A1
- open access
Sensing the framework state and guest molecules in MIL-53(Al) via the electron paramagnetic resonance spectrum of V-IV dopant ions
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Molecular layer deposition of 'titanicone', a titanium-based hybrid material, as an electrode for lithium-ion batteries
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- Conference Paper
- C3
- open access
Plasma-enhanced ALD on particles and powders
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- Conference Paper
- C3
- open access
Plasma-enhanced ALD : a route to hydrophilic, glueable PTFE
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- Conference Paper
- C3
- open access
Thermal and plasma enhanced atomic layer deposition on powders and particles
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Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
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Combinatorial study of Ag-Te thin films and their application as cation supply layer in CBRAM cells
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Thermal and plasma-enhanced atomic layer deposition of TiN using TDMAT and NH3 on particles agitated in a rotary reactor
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Controllable nitrogen doping in as deposited TiO₂ film and its effect on post deposition annealing
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Crystallization and semiconductor-metal switching behavior of thin VO₂ layers grown by atomic layer deposition
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- Conference Paper
- C3
- open access
Atomic layer deposition : a 3D surface engineering technique for nanomaterials
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- Conference Paper
- C3
- open access
Conformal nanocoatings for surface engineering of particles by thermal and plasma-enhanced atomic layer deposition using a rotary reactor
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Reactor concepts for atomic layer deposition on agitated particles: a review
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A Single-Event MicroKinetic assessment of n-alkane hydroconversion on ultrastable Y zeolites after atomic layer deposition of alumina
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Plasma enhanced atomic layer deposition on powders
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Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
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Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
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- Conference Paper
- C1
- open access
A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
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- Conference Paper
- C3
- open access
Thermal and plasma-enhanced ALD of TiN on powders using a rotary reactor
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- Conference Paper
- C3
- open access
Low temperature plasma-enhanced ALD of vanadium nitride as copper diffusion barrier
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Study of Schottky barrier height modulation for NiSi/Si contact with an antimony interlayer
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- Conference Paper
- C3
- open access
Plasma-enhanced atomic layer deposition of thin vanadium nitride layers as a copper diffusion barrier
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TaN/Ta as an effective diffusion barrier for direct contact of copper and NiSi
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A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
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Anisotropic atomic layer deposition profiles of TiO₂ in hierarchical silica material with multiple porosity
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Germanium surface passivation and atomic layer deposition of high-k dielectrics: a tutorial review on Ge-based MOS capacitors
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Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate
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Fermi level depinning failure for Al/GeO₂/Ge contacts
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Plasma-enhanced ALD of platinum with O₂, N₂ and NH₃ plasmas
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- Conference Paper
- C3
- open access
Optimization of the annealing conditions for thin VO2 ALD films
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Improved thermal stability and electrical performance by using PEALD ultrathin Al2O3 film with Ta as Cu diffusion barrier on low k dielectrics
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- Conference Paper
- C3
- open access
Semiconductor-metal transition in thin VO2 films deposited by ozone based atomic layer deposition
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High-performance Ge MOS capacitors by O₂ plasma passivation and O₂ ambient annealing
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Effective Schottky Barrier height modulation by an ultrathin passivation layer of GeOxNy for Al/n-Ge(100) contact
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Annealing induced hysteresis suppression for TiN/HfO₂/GeON/p-Ge capacitor
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- Conference Paper
- C3
- open access
Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition
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Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition
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In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films
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TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition
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- Journal Article
- A1
- open access
Effective electrical passivation of Ge(100) for HfO2 gate dielectric layers using O-2 plasma
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Aluminium atomic layer deposition applied to mesoporous zeolites for acid catalytic activity enhancement
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Spacious and mechanically flexible mesoporous silica thin film composed of an open network of interlinked nanoslabs
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- Journal Article
- A1
- open access
Effective reduction of fixed charge densities in germanium based metal-oxide-semiconductor devices
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- Conference Paper
- C3
- open access
ALD-Modified USY zeolite characterization using single-event microkinetics
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Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition
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In situ X-ray diffraction study of thin film Ir/Si solid state reactions
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Texture of atomic layer deposited ruthenium
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Single-event microkinetic model based design of tailored zeolite catalysts through atomic layer deposition
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Implementing TiO2 as gate dielectric for Ge-channel complementary metal-oxide-semiconductor devices by using HfO2/GeO2 interlayer
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The effect of sputtered W-based carbide diffusion barriers on the thermal stability and void formation in copper thin films
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- Conference Paper
- C3
- open access
Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition
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- Conference Paper
- C3
- open access
In situ x-ray fluorescence measurements during ALD on flat substrates and in nanoporous
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Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide
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Ru thin film grown on TaN by plasma enhanced atomic layer deposition
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Atomic layer deposition of titanium nitride from TDMAT precursor
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Modeling the conformality of atomic layer deposition: the effect of sticking probability
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- Conference Paper
- C3
- open access
Modeling the conformality of atomic layer deposition: the effect of sticking probability
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Thermal versus plasma-enhanced ALD : growth kinetics and conformality
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Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots
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Formation and stability of NiSi in the presence of Co and Fe alloying elements
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Nucleation and diffusion during growth of ternary Co1-xNixSi2 thin films studied by complementary techniques in real time
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Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N-2 or NH3 plasma
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- Conference Paper
- C3
- open access
Conformality of thermal and plasma enhanced ALD
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Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition
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Effect of Pt addition on growth stress and thermal stress of NiSi films
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Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O
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Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements
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Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions
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An in situ study of the stability of thin Ni-silicide layers
(2006) -
In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation
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In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation
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High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation
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Room temperature grain growth in sputtered Cu films
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Room temperature grain growth in sputtered Cu films
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Room-temperature grain growth in sputter-deposited Cu films