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- Journal Article
- A1
- open access
Plasma-enhanced atomic layer deposition of nickel and cobalt phosphate for lithium ion batteries
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An IR spectroscopy study of the degradation of surface bound azido-groups in high vacuum
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- Conference Paper
- C3
- open access
Titanium carboxylate MLD hybrid films as protective coatings for lithium-ion batteries
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- Conference Paper
- C3
- open access
Titanium carboxylate molecular layer deposited hybrid films as protective coatings for lithium-ion batteries
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- Journal Article
- A1
- open access
Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
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- Conference Paper
- C3
- open access
Nitrogen doping of Al- and Ti-phosphate through plasma-enhanced ALD
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- Journal Article
- A1
- open access
Atomic layer deposition of nitrogen-doped Al phosphate coatings for Li-ion battery applications
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Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium
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Biocompatible ALD coatings as a protective barrier for copper
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- Journal Article
- A2
- open access
A USB-controlled potentiostat/galvanostat for thin-film battery characterization
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Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
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Heterogeneous TiO2/V2O5/carbon nanotube electrodes for lithium-ion batteries
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Unravelling the role of ALD Al2O3 and TiO2 protective coatings on lithium-ion battery electrodes
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Growth-inhibited nucleation enhancement: from high density nanoparticle deposits to nanometer thin continuous films
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Plasma-enhanced atomic layer deposition of iron phosphate as a positive electrode for 3D lithium-ion microbatteries
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Deposition of MnO anode and MnO2 cathode thin films by plasma enhanced atomic layer deposition using the Mn(thd)3 precursor
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- Journal Article
- A1
- open access
Atomic layer deposition of aluminum phosphate based on the plasma polymerization of trimethyl phosphate
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- Conference Paper
- C3
- open access
Controlling the oxidation state of manganese during plasma enhanced atomic layer deposition using the Mn(thd)3 precursor
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- Conference Paper
- C3
- open access
Control of the oxidation state of manganese during plasma enhanced atomic layer deposition with the Mn(thd)3 precursor
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Ultra-low copper baths for sub-35 nm copper interconnects
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Tailoring copper island density for copper plating on a RuTa substrate
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Electroreduction of Co2+ and Ni2+ at III-V semiconductors and properties of the semiconductor/metal interfaces formed
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Elektrochemische reductie van koperionen aan galliumarsenide-éénkristallen en eigenschappen van de gevormde GaAs/Cu-fasegrenzen
(1998) -
Electrochemical reduction vs, vapour deposition for n-GaAs/Cu Schottky-barrier formation : a comparative study