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Ternary silicide formation from Ni-Pt, Ni-Pd and Pt-Pd alloys on Si(100) : nucleation and solid solubility of the monosilicides
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The role of composition and microstructure in Ni-W silicide formation and low temperature epitaxial NiSi2 growth by premixing Si
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Phase formation and texture of thin nickel germanides on Ge(001) and Ge(111)
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- Journal Article
- A1
- open access
On the nucleation of PdSi and NiSi2 during the ternary Ni(Pd)/Si(100) reaction
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- Journal Article
- A1
- open access
Effect of high temperature deposition on CoSi2 phase formation
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- Journal Article
- A1
- open access
On the growth kinetics of Ni(Pt) silicide thin films
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Determination of the dominant diffusing species during nickel and palladium germanide formation
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- Journal Article
- A1
- open access
In situ study of the growth properties of Ni-rare earth silicides for interlayer and alloy systems on Si(100)
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- Journal Article
- A1
- open access
Sn diffusion during Ni germanide growth on Ge1-xSnx
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The influence of Pt redistribution on Ni1-xPtxSi growth properties
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Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots
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Nucleation and diffusion during growth of ternary Co1-xNixSi2 thin films studied by complementary techniques in real time
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- Journal Article
- A1
- open access
Interpreting Mössbauer spectra reflecting an infinite number of sites : an application to Fe1-xSi synthesized by pulsed laser annealing