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Impurity controlled thin film growth
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How the process pressure influences the microstructure of YSZ thin films?
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Influence of Al doping on the bandgap of TiOx
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Putting a rotatable magnetron to the test with high power impulse magnetron sputtering
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Linking reactive sputtering models to experimental reality by determining the real-time parameters
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Relation between hardness of TiN sputtered coatings and the substrate fluxes
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Using mass spectrometry to gather some insights in the fundamentals of the reactive magnetron sputtering process of Al with O2
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A fit procedure to determine the mean vanadium oxidation state from V2p phtotelectron spectra
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A Monte Carlo simulation of the erosion profile of a rotating cylindrical magnetron
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Growth and optimization of biaxially aligned MgO deposited by unbalanced magnetron sputtering