Show 10 5 10 15 20 50 100 250 Sort by year (new to old) Actions Download search results Subscribe to news feed Your filters: cql: author="Laubis, Christian" or (type any "bookEditor issueEditor" and editor="Laubis, Christian") Add to list Journal Article A1 open access Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography Vu Luong, Vicky Philipsen, Karl Opsomer, Jens Rip, Eric Hendrickx, Marc Heyns, Christophe Detavernier (UGent) , Christian Laubis and Frank Scholze (2019) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 37(6). Add to list Conference Paper P1 Mask absorber development to enable next-generation EUVL Vicky Philipsen, Kim Vu Luong, Karl Opsomer, Laurent Souriau, Jens Rip, Christophe Detavernier (UGent) , Andreas Erdmann, Peter Evanschitzky, Christian Laubis, Philipp Hoenicke, et al. (2019) XXVI SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY (PHOTOMASK JAPAN 2019). In Proceedings of SPIE 11178. Add to list Journal Article A1 open access Ni-Al alloys as alternative EUV mask absorber Vu Luong, Vicky Philipsen, Eric Hendrickx, Karl Opsomer, Christophe Detavernier (UGent) , Christian Laubis, Frank Scholze and Marc Heyns (2018) APPLIED SCIENCES-BASEL. 8(4). Add to list Conference Paper P1 Novel EUV mask absorber evaluation in support of next-generation EUV imaging Vicky Philipsen, Kim Vu Luong, Karl Opsomer, Christophe Detavernier (UGent) , Eric Hendrickx, Andreas Erdmann, Peter Evanschitzky, Robbert WE van de Kruijs, Zahra Heidarnia-Fathabad, Frank Scholze, et al. (2018) Photomask technology 2018. In Proceedings of SPIE 10810.