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  • 2025
    • A1
    • journalArticle
    Convergence during feedback controlled reactive magnetron sputtering : mechanisms and classification Josja Van Bever UGent, Koen Strijckmans UGent, S. Konstantinidis and Diederik Depla UGent (2025) SURFACE & COATINGS TECHNOLOGY. 507.
    • A1
    • journalArticle
    A python-based approach to sputter deposition simulations in combinatorial materials science F. Thelen, R. Zehl, J.L. Bürgel, Diederik Depla UGent and A. Ludwig (2025) SURFACE & COATINGS TECHNOLOGY. 503.
    • A1
    • journalArticle
    Industrial reactive sputter deposition of TiZrN coatings : the role of nitrogen partial pressure Sahand Behrangi, Diederik Depla UGent, Pavel Souček, Zsolt Czigány, Vilma Buršíková, Katalin Balázsi and Petr Vašina (2025) SURFACE & COATINGS TECHNOLOGY. 499.
  • 2024
    • A1
    • journalArticle
    Note on the low deposition rate during reactive magnetron sputtering Diederik Depla UGent (2024) VACUUM. 228.
    • A1
    • journalArticle
    Calculation of oxide sputter yields Diederik Depla UGent and Josja Van Bever UGent (2024) VACUUM. 222.
    • A1
    • journalArticle
    The measurement and impact of negative oxygen ions during reactive sputter deposition Diederik Depla UGent (2024) CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES. 49(4). p.718-753
    • A1
    • journalArticle
    Phase composition of sputter deposited tungsten thin films Farzaneh Ahangarani Farahani UGent and Diederik Depla UGent (2024) SURFACE & COATINGS TECHNOLOGY. 494.
    • A1
    • journalArticle
    Plasmonic effects in the neutralization of slow ions at a metallic surface Marnik Bercx, Selma Mayda, Diederik Depla UGent, Bart Partoens and Dirk Lamoen (2024) CONTRIBUTIONS TO PLASMA PHYSICS. 64(1).
    • A1
    • journalArticle
    PM2.5 and PM10 adsorption onto filters and surfaces functionalized with calcium carbonate particle assembly Karaneh Eftekhari UGent, Louis Van der Meeren UGent, Diederik Depla UGent, Bogdan Parakhonskiy UGent and Andre Skirtach UGent (2024) COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS. 680.
  • 2023
    • A1
    • journalArticle
    On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering Diederik Depla UGent (2023) VACUUM. 217.
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