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In situ X-ray diffraction study of thin film Ir/Si solid state reactions

Werner Knaepen UGent, J Demeulemeester, Davy Deduytsche UGent, JL Jordan-Sweet, A Vantomme, Roland Vanmeirhaeghe, Christophe Detavernier UGent and C Lavoie (2010) MICROELECTRONIC ENGINEERING. 87(3). p.258-262
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
RTA, KINETICS, VACUUM, SILICON, STABILITY, XRD, NiSi, Ir, Si, LAYERS, NICKEL, IRIDIUM SILICIDES
journal title
MICROELECTRONIC ENGINEERING
Microelectron. Eng.
volume
87
issue
3
pages
5 pages
conference name
18th European Workshop on Materials for Advanced Metallization
conference location
Grenoble, France
conference start
2009-03-08
conference end
2009-03-11
Web of Science type
Proceedings Paper
Web of Science id
000275221600005
JCR category
ENGINEERING, ELECTRICAL & ELECTRONIC
JCR impact factor
1.569 (2010)
JCR rank
66/247 (2010)
JCR quartile
2 (2010)
ISSN
0167-9317
DOI
10.1016/j.mee.2009.06.002
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
977815
handle
http://hdl.handle.net/1854/LU-977815
date created
2010-06-14 12:10:42
date last changed
2016-12-19 15:44:23
@article{977815,
  author       = {Knaepen, Werner and Demeulemeester, J and Deduytsche, Davy and Jordan-Sweet, JL and Vantomme, A and Vanmeirhaeghe, Roland and Detavernier, Christophe and Lavoie, C},
  issn         = {0167-9317},
  journal      = {MICROELECTRONIC ENGINEERING},
  keyword      = {RTA,KINETICS,VACUUM,SILICON,STABILITY,XRD,NiSi,Ir,Si,LAYERS,NICKEL,IRIDIUM SILICIDES},
  language     = {eng},
  location     = {Grenoble, France},
  number       = {3},
  pages        = {258--262},
  title        = {In situ X-ray diffraction study of thin film Ir/Si solid state reactions},
  url          = {http://dx.doi.org/10.1016/j.mee.2009.06.002},
  volume       = {87},
  year         = {2010},
}

Chicago
Knaepen, Werner, J Demeulemeester, Davy Deduytsche, JL Jordan-Sweet, A Vantomme, Roland Vanmeirhaeghe, Christophe Detavernier, and C Lavoie. 2010. “In Situ X-ray Diffraction Study of Thin Film Ir/Si Solid State Reactions.” Microelectronic Engineering 87 (3): 258–262.
APA
Knaepen, W., Demeulemeester, J., Deduytsche, D., Jordan-Sweet, J., Vantomme, A., Vanmeirhaeghe, R., Detavernier, C., et al. (2010). In situ X-ray diffraction study of thin film Ir/Si solid state reactions. MICROELECTRONIC ENGINEERING, 87(3), 258–262. Presented at the 18th European Workshop on Materials for Advanced Metallization.
Vancouver
1.
Knaepen W, Demeulemeester J, Deduytsche D, Jordan-Sweet J, Vantomme A, Vanmeirhaeghe R, et al. In situ X-ray diffraction study of thin film Ir/Si solid state reactions. MICROELECTRONIC ENGINEERING. 2010;87(3):258–62.
MLA
Knaepen, Werner, J Demeulemeester, Davy Deduytsche, et al. “In Situ X-ray Diffraction Study of Thin Film Ir/Si Solid State Reactions.” MICROELECTRONIC ENGINEERING 87.3 (2010): 258–262. Print.