Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
- Author
- Sofie Vandenbroucke (UGent) , Elisabeth Levrau, Matthias Minjauw (UGent) , Michiel Van Daele, Eduardo Solano Minuesa (UGent) , Rita Vos, Jolien Dendooven (UGent) and Christophe Detavernier (UGent)
- Organization
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-8688087
- MLA
- Vandenbroucke, Sofie, et al. “Study of the Surface Species during Thermal and Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Films Using in Situ IR-Spectroscopy and in Vacuo X-Ray Photoelectron Spectroscopy.” AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Abstracts, 2020.
- APA
- Vandenbroucke, S., Levrau, E., Minjauw, M., Van Daele, M., Solano Minuesa, E., Vos, R., … Detavernier, C. (2020). Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy. AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Abstracts. Presented at the ALD/ALE 2020, Online.
- Chicago author-date
- Vandenbroucke, Sofie, Elisabeth Levrau, Matthias Minjauw, Michiel Van Daele, Eduardo Solano Minuesa, Rita Vos, Jolien Dendooven, and Christophe Detavernier. 2020. “Study of the Surface Species during Thermal and Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Films Using in Situ IR-Spectroscopy and in Vacuo X-Ray Photoelectron Spectroscopy.” In AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Abstracts.
- Chicago author-date (all authors)
- Vandenbroucke, Sofie, Elisabeth Levrau, Matthias Minjauw, Michiel Van Daele, Eduardo Solano Minuesa, Rita Vos, Jolien Dendooven, and Christophe Detavernier. 2020. “Study of the Surface Species during Thermal and Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Films Using in Situ IR-Spectroscopy and in Vacuo X-Ray Photoelectron Spectroscopy.” In AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Abstracts.
- Vancouver
- 1.Vandenbroucke S, Levrau E, Minjauw M, Van Daele M, Solano Minuesa E, Vos R, et al. Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy. In: AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Abstracts. 2020.
- IEEE
- [1]S. Vandenbroucke et al., “Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy,” in AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Abstracts, Online, 2020.
@inproceedings{8688087,
author = {{Vandenbroucke, Sofie and Levrau, Elisabeth and Minjauw, Matthias and Van Daele, Michiel and Solano Minuesa, Eduardo and Vos, Rita and Dendooven, Jolien and Detavernier, Christophe}},
booktitle = {{AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Abstracts}},
language = {{eng}},
location = {{Online}},
title = {{Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy}},
year = {{2020}},
}