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Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

(2020) PHYSICAL CHEMISTRY CHEMICAL PHYSICS. 22(17). p.9262-9271
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Abstract
The thermal and plasma-enhanced atomic layer deposition (ALD) growth of titanium oxide using an alkylamine precursor - tetrakis(dimethylamino)titanium (TDMAT) - was investigated. The surface species present during both the precursor and co-reactant pulse were studied with in situ reflection mid-IR spectroscopy (FTIR) and in vacuo X-ray photoelectron spectroscopy (XPS). The thermal process using H2O vapor proceeds through a typical ligand exchange reaction mechanism. The plasma-enhanced ALD processes using H2O-plasma or O-2-plasma exhibit an additional decomposition and combustion reaction mechanism. After the plasma exposure, imine (N & xe001;C) and isocyanate (N & xe001;C & xe001;O) surface species were observed by in situ FTIR. In addition, nitrites (NOx) were detected using in vacuo XPS during the O-2-plasma process. This study presents the importance of the use of in situ FTIR and in vacuo XPS as complementary techniques to learn more about the ALD reaction mechanism. While in situ FTIR is very sensitive to changes of chemical bonds at the surface, exact identification and quantification could only be done with the aid of in vacuo XPS.
Keywords
Physical and Theoretical Chemistry, General Physics and Astronomy, TIN THIN-FILMS, INFRARED-SPECTROSCOPY, REACTION MECHANISMS, ISOCYANIC ACID, ALKYLAMIDE PRECURSOR, ADSORPTION, TIO2, CHEMISTRY, HAFNIUM, XPS

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MLA
Vandenbroucke, Sofie, et al. “Study of the Surface Species during Thermal and Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Films Using in Situ IR-Spectroscopy and in Vacuo X-Ray Photoelectron Spectroscopy.” PHYSICAL CHEMISTRY CHEMICAL PHYSICS, vol. 22, no. 17, 2020, pp. 9262–71, doi:10.1039/d0cp00395f.
APA
Vandenbroucke, S., Levrau, E., Minjauw, M., Van Daele, M., Solano Minuesa, E., Vos, R., … Detavernier, C. (2020). Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy. PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 22(17), 9262–9271. https://doi.org/10.1039/d0cp00395f
Chicago author-date
Vandenbroucke, Sofie, Elisabeth Levrau, Matthias Minjauw, Michiel Van Daele, Eduardo Solano Minuesa, Rita Vos, Jolien Dendooven, and Christophe Detavernier. 2020. “Study of the Surface Species during Thermal and Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Films Using in Situ IR-Spectroscopy and in Vacuo X-Ray Photoelectron Spectroscopy.” PHYSICAL CHEMISTRY CHEMICAL PHYSICS 22 (17): 9262–71. https://doi.org/10.1039/d0cp00395f.
Chicago author-date (all authors)
Vandenbroucke, Sofie, Elisabeth Levrau, Matthias Minjauw, Michiel Van Daele, Eduardo Solano Minuesa, Rita Vos, Jolien Dendooven, and Christophe Detavernier. 2020. “Study of the Surface Species during Thermal and Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Films Using in Situ IR-Spectroscopy and in Vacuo X-Ray Photoelectron Spectroscopy.” PHYSICAL CHEMISTRY CHEMICAL PHYSICS 22 (17): 9262–9271. doi:10.1039/d0cp00395f.
Vancouver
1.
Vandenbroucke S, Levrau E, Minjauw M, Van Daele M, Solano Minuesa E, Vos R, et al. Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy. PHYSICAL CHEMISTRY CHEMICAL PHYSICS. 2020;22(17):9262–71.
IEEE
[1]
S. Vandenbroucke et al., “Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy,” PHYSICAL CHEMISTRY CHEMICAL PHYSICS, vol. 22, no. 17, pp. 9262–9271, 2020.
@article{8659142,
  abstract     = {The thermal and plasma-enhanced atomic layer deposition (ALD) growth of titanium oxide using an alkylamine precursor - tetrakis(dimethylamino)titanium (TDMAT) - was investigated. The surface species present during both the precursor and co-reactant pulse were studied with in situ reflection mid-IR spectroscopy (FTIR) and in vacuo X-ray photoelectron spectroscopy (XPS). The thermal process using H2O vapor proceeds through a typical ligand exchange reaction mechanism. The plasma-enhanced ALD processes using H2O-plasma or O-2-plasma exhibit an additional decomposition and combustion reaction mechanism. After the plasma exposure, imine (N & xe001;C) and isocyanate (N & xe001;C & xe001;O) surface species were observed by in situ FTIR. In addition, nitrites (NOx) were detected using in vacuo XPS during the O-2-plasma process. This study presents the importance of the use of in situ FTIR and in vacuo XPS as complementary techniques to learn more about the ALD reaction mechanism. While in situ FTIR is very sensitive to changes of chemical bonds at the surface, exact identification and quantification could only be done with the aid of in vacuo XPS.},
  author       = {Vandenbroucke, Sofie and Levrau, Elisabeth and Minjauw, Matthias and Van Daele, Michiel and Solano Minuesa, Eduardo and Vos, Rita and Dendooven, Jolien and Detavernier, Christophe},
  issn         = {1463-9076},
  journal      = {PHYSICAL CHEMISTRY CHEMICAL PHYSICS},
  keywords     = {Physical and Theoretical Chemistry,General Physics and Astronomy,TIN THIN-FILMS,INFRARED-SPECTROSCOPY,REACTION MECHANISMS,ISOCYANIC ACID,ALKYLAMIDE PRECURSOR,ADSORPTION,TIO2,CHEMISTRY,HAFNIUM,XPS},
  language     = {eng},
  number       = {17},
  pages        = {9262--9271},
  title        = {Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy},
  url          = {http://dx.doi.org/10.1039/d0cp00395f},
  volume       = {22},
  year         = {2020},
}

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