- Author
- Geert Rampelberg (UGent) , Véronique Cremers (UGent) , Andreas Werbrouck (UGent) , Jolien Dendooven (UGent) and Christophe Detavernier (UGent)
- Organization
Downloads
-
Geert Rampelberg - PE-ALD of pure and doped SiO2.pdf
- full text (Author's original)
- |
- open access
- |
- |
- 82.97 KB
Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-8643670
- MLA
- Rampelberg, Geert, et al. Cost-Reducing PE-ALD Processes for Pure and Doped SiO2 Thin Films. 2019.
- APA
- Rampelberg, G., Cremers, V., Werbrouck, A., Dendooven, J., & Detavernier, C. (2019). Cost-reducing PE-ALD processes for pure and doped SiO2 thin films. Presented at the EuroCVD 22-Baltic ALD 16, Luxembourg, Luxenbourg.
- Chicago author-date
- Rampelberg, Geert, Véronique Cremers, Andreas Werbrouck, Jolien Dendooven, and Christophe Detavernier. 2019. “Cost-Reducing PE-ALD Processes for Pure and Doped SiO2 Thin Films.” In .
- Chicago author-date (all authors)
- Rampelberg, Geert, Véronique Cremers, Andreas Werbrouck, Jolien Dendooven, and Christophe Detavernier. 2019. “Cost-Reducing PE-ALD Processes for Pure and Doped SiO2 Thin Films.” In .
- Vancouver
- 1.Rampelberg G, Cremers V, Werbrouck A, Dendooven J, Detavernier C. Cost-reducing PE-ALD processes for pure and doped SiO2 thin films. In 2019.
- IEEE
- [1]G. Rampelberg, V. Cremers, A. Werbrouck, J. Dendooven, and C. Detavernier, “Cost-reducing PE-ALD processes for pure and doped SiO2 thin films,” presented at the EuroCVD 22-Baltic ALD 16, Luxembourg, Luxenbourg, 2019.
@inproceedings{8643670, author = {{Rampelberg, Geert and Cremers, Véronique and Werbrouck, Andreas and Dendooven, Jolien and Detavernier, Christophe}}, language = {{eng}}, location = {{Luxembourg, Luxenbourg}}, title = {{Cost-reducing PE-ALD processes for pure and doped SiO2 thin films}}, year = {{2019}}, }