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Cost-reducing PE-ALD processes for pure and doped SiO2 thin films

(2019)
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MLA
Rampelberg, Geert, et al. Cost-Reducing PE-ALD Processes for Pure and Doped SiO2 Thin Films. 2019.
APA
Rampelberg, G., Cremers, V., Werbrouck, A., Dendooven, J., & Detavernier, C. (2019). Cost-reducing PE-ALD processes for pure and doped SiO2 thin films. Presented at the EuroCVD 22-Baltic ALD 16, Luxembourg, Luxenbourg.
Chicago author-date
Rampelberg, Geert, Véronique Cremers, Andreas Werbrouck, Jolien Dendooven, and Christophe Detavernier. 2019. “Cost-Reducing PE-ALD Processes for Pure and Doped SiO2 Thin Films.” In .
Chicago author-date (all authors)
Rampelberg, Geert, Véronique Cremers, Andreas Werbrouck, Jolien Dendooven, and Christophe Detavernier. 2019. “Cost-Reducing PE-ALD Processes for Pure and Doped SiO2 Thin Films.” In .
Vancouver
1.
Rampelberg G, Cremers V, Werbrouck A, Dendooven J, Detavernier C. Cost-reducing PE-ALD processes for pure and doped SiO2 thin films. In 2019.
IEEE
[1]
G. Rampelberg, V. Cremers, A. Werbrouck, J. Dendooven, and C. Detavernier, “Cost-reducing PE-ALD processes for pure and doped SiO2 thin films,” presented at the EuroCVD 22-Baltic ALD 16, Luxembourg, Luxenbourg, 2019.
@inproceedings{8643670,
  author       = {{Rampelberg, Geert and Cremers, Véronique and Werbrouck, Andreas and Dendooven, Jolien and Detavernier, Christophe}},
  language     = {{eng}},
  location     = {{Luxembourg, Luxenbourg}},
  title        = {{Cost-reducing PE-ALD processes for pure and doped SiO2 thin films}},
  year         = {{2019}},
}