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Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability

Bo Zhao (UGent) , Felix Mattelaer (UGent) , Geert Rampelberg (UGent) , Jolien Dendooven (UGent) and Christophe Detavernier (UGent)
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Abstract
The atomic layer deposition (ALD) of yttrium oxide (Y2O3) is investigated using the liquid precursor Y(EtCp)2(iPr-amd) as the yttrium source with thermal (H2O) and plasma-enhanced (H2O plasma and O2 plasma) processes, respectively. Saturation is confirmed for the growth of the Y2O3 films with each investigated reactant with a similar ALD window from 150 to 300 °C, albeit with a different growth rate. All of the as-deposited Y2O3 films are pure and smooth and have a polycrystalline cubic structure. The as-deposited Y2O3 films are hydrophobic with water contact angles >90°. The water contact angle gradually increased and the surface free energy gradually decreased as the film thickness increased, reaching a saturated value at a Y2O3 film thickness of ∼20 nm. The hydrophobicity was retained during post-ALD annealed at 500 °C in static air for 2 h. Exposure to polar and nonpolar solvents influences the Y2O3 water contact angle. The reported ALD process for Y2O3 films may find potential applications in the field of hydrophobic coatings.
Keywords
atomic layer deposition, plasma-enhanced, heteroleptic precursor, yttrium oxide, water contact angle, Y2O3 THIN-FILMS, OPTICAL-PROPERTIES, FUEL-CELLS, LUMINESCENCE PROPERTIES, AMBIENT CONDITIONS, AGING BEHAVIOR, HYDROPHOBICITY, ELECTROLYTE, PRECURSOR, COATINGS

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Citation

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MLA
Zhao, Bo, et al. “Thermal and Plasma-Enhanced Atomic Layer Deposition of Yttrium Oxide Films and the Properties of Water Wettability.” ACS APPLIED MATERIALS & INTERFACES, vol. 12, no. 2, 2020, pp. 3179–87.
APA
Zhao, B., Mattelaer, F., Rampelberg, G., Dendooven, J., & Detavernier, C. (2020). Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability. ACS APPLIED MATERIALS & INTERFACES, 12(2), 3179–3187.
Chicago author-date
Zhao, Bo, Felix Mattelaer, Geert Rampelberg, Jolien Dendooven, and Christophe Detavernier. 2020. “Thermal and Plasma-Enhanced Atomic Layer Deposition of Yttrium Oxide Films and the Properties of Water Wettability.” ACS APPLIED MATERIALS & INTERFACES 12 (2): 3179–87.
Chicago author-date (all authors)
Zhao, Bo, Felix Mattelaer, Geert Rampelberg, Jolien Dendooven, and Christophe Detavernier. 2020. “Thermal and Plasma-Enhanced Atomic Layer Deposition of Yttrium Oxide Films and the Properties of Water Wettability.” ACS APPLIED MATERIALS & INTERFACES 12 (2): 3179–3187.
Vancouver
1.
Zhao B, Mattelaer F, Rampelberg G, Dendooven J, Detavernier C. Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability. ACS APPLIED MATERIALS & INTERFACES. 2020;12(2):3179–87.
IEEE
[1]
B. Zhao, F. Mattelaer, G. Rampelberg, J. Dendooven, and C. Detavernier, “Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability,” ACS APPLIED MATERIALS & INTERFACES, vol. 12, no. 2, pp. 3179–3187, 2020.
@article{8641774,
  abstract     = {The atomic layer deposition (ALD) of yttrium oxide (Y2O3) is investigated using the liquid precursor Y(EtCp)2(iPr-amd) as the yttrium source with thermal (H2O) and plasma-enhanced (H2O plasma and O2 plasma) processes, respectively. Saturation is confirmed for the growth of the Y2O3 films with each investigated reactant with a similar ALD window from 150 to 300 °C, albeit with a different growth rate. All of the as-deposited Y2O3 films are pure and smooth and have a polycrystalline cubic structure. The as-deposited Y2O3 films are hydrophobic with water contact angles >90°. The water contact angle gradually increased and the surface free energy gradually decreased as the film thickness increased, reaching a saturated value at a Y2O3 film thickness of ∼20 nm. The hydrophobicity was retained during post-ALD annealed at 500 °C in static air for 2 h. Exposure to polar and nonpolar solvents influences the Y2O3 water contact angle. The reported ALD process for Y2O3 films may find potential applications in the field of hydrophobic coatings.},
  author       = {Zhao, Bo and Mattelaer, Felix and Rampelberg, Geert and Dendooven, Jolien and Detavernier, Christophe},
  issn         = {1944-8244},
  journal      = {ACS APPLIED MATERIALS & INTERFACES},
  keywords     = {atomic layer deposition,plasma-enhanced,heteroleptic precursor,yttrium oxide,water contact angle,Y2O3 THIN-FILMS,OPTICAL-PROPERTIES,FUEL-CELLS,LUMINESCENCE PROPERTIES,AMBIENT CONDITIONS,AGING BEHAVIOR,HYDROPHOBICITY,ELECTROLYTE,PRECURSOR,COATINGS},
  language     = {eng},
  number       = {2},
  pages        = {3179--3187},
  title        = {Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability},
  url          = {http://dx.doi.org/10.1021/acsami.9b18412},
  volume       = {12},
  year         = {2020},
}

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